Inventor

CHIEN SHANG-CHIEH

TW174 patents

⚠️ This page may combine multiple inventors who share the name “CHIEN SHANG-CHIEH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHIEN SHANG-CHIEH

TAIWAN SEMICONDUCTOR MFG CO LTD

Method of making an extreme ultraviolet pellicle

System and method for extreme ultraviolet source control

System and method for dynamically controlling temperature of thermostatic reticles

Radiation source for lithography process

Mask cleaning

Lithography system with an embedded cleaning module

Lithography apparatus and method for protecting a reticle

Particle image velocimetry of extreme ultraviolet lithography systems

EUV vessel inspection method and related system

Method and apparatus for removing debris from collector

Lithography apparatus and method

System and method for omnidirectional real time detection of photolithography characteristics

Method and apparatus for mitigating tin debris

Droplet generator and method of servicing a photolithographic tool

Methods of cleaning a lithography system

EUV light source and apparatus for lithography

System and method for detecting debris in a photolithography system

Lithography contamination control

Lithography apparatus and method for using the same

Particle removal device and method

Radiation source for lithography process

Droplet generator and method of servicing a photolithographic tool

EUV light source and apparatus for lithography

Apparatus and method for generating extreme ultraviolet radiation

Extreme ultraviolet control system for adjusting droplet illumination parameters

Radiation source apparatus and method for decreasing debris in radiation source apparatus

Radiation source for lithography process

Vessel for extreme ultraviolet radiation source

EUV light source and apparatus for lithography

System and method for extreme ultraviolet source control

Radiation source apparatus

Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system

Extreme ultraviolet radiation source and cleaning method thereof

Extreme ultraviolet radiation source and droplet catcher thereof

Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system

Light source for lithography exposure process

System and method for performing lithography process in semiconductor device fabrication

Particle removal system and method thereof

Rotary EUV collector

Method of making an extreme ultraviolet pellicle

Particle image velocimetry of extreme ultraviolet lithography systems

System and method for performing extreme ultraviolet photolithography processes

Particle image velocimetry of extreme ultraviolet lithography systems

Radiation source apparatus and method for using the same

System and method for supplying target material in an EUV light source

System and method for performing extreme ultraviolet photolithography processes

Collector pellicle

Extreme ultraviolet (EUV) radiation source and a method for generating extreme ultraviolet radiation

EUV vessel inspection method and related system

TAIWAN SEMICONDUCTOR MFG

Method for lithography patterning