Inventor
HSIEH CHIEH
TW44 patents
⚠️ This page may combine multiple inventors who share the name “HSIEH CHIEH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
43 patentsUS10314154B1Jun 4, 2019
System and method for extreme ultraviolet source control
TAIWAN SEMICONDUCTOR MFG CO LTD13 citations92
US10274844B1Apr 30, 2019
Lithography apparatus and method for protecting a reticle
TAIWAN SEMICONDUCTOR MFG CO LTD13 citations84
US12019378B2Jun 25, 2024
Methods of cleaning a lithography system
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11693324B2Jul 4, 2023
System and method for detecting debris in a photolithography system
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11662668B2May 30, 2023
Lithography contamination control
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11437161B1Sep 6, 2022
Lithography apparatus and method for using the same
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10969690B2Apr 6, 2021
Extreme ultraviolet control system for adjusting droplet illumination parameters
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10955762B2Mar 23, 2021
Radiation source apparatus and method for decreasing debris in radiation source apparatus
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10842009B2Nov 17, 2020
System and method for extreme ultraviolet source control
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10712676B2Jul 14, 2020
Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10495987B2Dec 3, 2019
Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10477663B2Nov 12, 2019
Light source for lithography exposure process
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11768437B2Sep 26, 2023
System and method for performing extreme ultraviolet photolithography processes
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US11392040B2Jul 19, 2022
System and method for performing extreme ultraviolet photolithography processes
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations72
US12591182B2Mar 31, 2026
Lithography contamination control
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12487534B2Dec 2, 2025
Semiconductor processing tool and methods of operation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12372887B2Jul 29, 2025
Methods of cleaning a lithography system
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12235594B2Feb 25, 2025
Method for performing lithography process, light source, and EUV lithography system
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12216413B2Feb 4, 2025
Device and method to remove debris from an extreme ultraviolet (EUV) lithography system
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12174545B2Dec 24, 2024
System and method for performing extreme ultraviolet photolithography processes
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12130555B2Oct 29, 2024
Method and apparatus for mitigating contamination
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12096544B2Sep 17, 2024
Lithography thermal control
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12085865B2Sep 10, 2024
System and method for detecting debris in a photolithography system
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US12055867B2Aug 6, 2024
Lithography contamination control
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12044975B2Jul 23, 2024
Extreme ultraviolet control system
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11841625B2Dec 12, 2023
Device and method to remove debris from an extreme ultraviolet (EUV) lithography system
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11703769B2Jul 18, 2023
Light source, EUV lithography system, and method for performing circuit layout patterning process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11675272B2Jun 13, 2023
Method and apparatus for mitigating contamination
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11647578B2May 9, 2023
Lithography thermal control
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11630393B2Apr 18, 2023
Apparatus and method for generating extreme ultraviolet radiation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11531278B2Dec 20, 2022
EUV lithography system and method for decreasing debris in EUV lithography system
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11483918B2Oct 25, 2022
Light source for lithography exposure process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11467498B2Oct 11, 2022
Extreme ultraviolet control system
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11333983B2May 17, 2022
Light source, EUV lithography system, and method for generating EUV radiation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11269257B2Mar 8, 2022
Apparatus and method for generating extreme ultraviolet radiation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11224115B2Jan 11, 2022
System and method for extreme ultraviolet source control
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11153959B2Oct 19, 2021
Apparatus and method for generating extreme ultraviolet radiation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10993308B2Apr 27, 2021
Light source for lithography exposure process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11632849B2Apr 18, 2023
Method and apparatus for mitigating contamination
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US10859918B2Dec 8, 2020
Semiconductor apparatus and method of operating the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10824083B2Nov 3, 2020
Light source, EUV lithography system, and method for generating EUV radiation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10802406B2Oct 13, 2020
Apparatus and method for generating extreme ultraviolet radiation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50
US10802405B2Oct 13, 2020
Radiation source for lithography exposure process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations42