Inventor

YANG CHI

TW59 patents

⚠️ This page may combine multiple inventors who share the name “YANG CHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

YANG CHI

TAIWAN SEMICONDUCTOR MFG CO LTD

Extreme ultraviolet lithography system

Pressurized tin collection bucket with in-line draining mechanism

Particle image velocimetry of extreme ultraviolet lithography systems

Method and apparatus for removing debris from collector

Lithography apparatus and method

Extreme ultraviolet lithography system

Apparatus and method for generating extreme ultraviolet radiation

Radiation source apparatus and method for decreasing debris in radiation source apparatus

Vessel for extreme ultraviolet radiation source

EUV light source and apparatus for lithography

Radiation source apparatus

Apparatus and method for monitoring reflectivity of the collector for extreme ultraviolet radiation source

Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system

Extreme ultraviolet radiation source and cleaning method thereof

Extreme ultraviolet radiation source and droplet catcher thereof

Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system

Particle image velocimetry of extreme ultraviolet lithography systems

Particle image velocimetry of extreme ultraviolet lithography systems

Collector pellicle

Extreme ultraviolet (EUV) radiation source and a method for generating extreme ultraviolet radiation

Lithography apparatus and method

Particle image velocimetry of extreme ultraviolet lithography systems

Extreme ultraviolet lithography system

Method for performing lithography process, light source, and EUV lithography system

Apparatus and method for generating extreme ultraviolet radiation

Plasma position control for extreme ultraviolet lithography light sources

Apparatus and method for generating extreme ultraviolet radiation

Light source, EUV lithography system, and method for performing circuit layout patterning process

Plasma position control for extreme ultraviolet lithography light sources

EUV lithography system and method for decreasing debris in EUV lithography system

Light source, EUV lithography system, and method for generating EUV radiation

Apparatus and method for monitoring reflectivity of the collector for extreme ultraviolet radiation source

Apparatus and method for generating extreme ultraviolet radiation

Extreme ultraviolet radiation source and cleaning method thereof

Pressurized tin collection bucket with in-line draining mechanism

Lithography apparatus and cleaning method thereof

Width adjustment of EUV radiation beam

Control of dynamic gas lock flow inlets of an intermediate focus cap

Module vessel with scrubber gutters sized to prevent overflow

Width adjustment of EUV radiation beam

Control of dynamic gas lock flow inlets of an intermediate focus cap

Pressurized tin collection bucket with in-line draining mechanism

Extreme ultraviolet radiation source

Light source, EUV lithography system, and method for generating EUV radiation

Lithography system and method thereof

UNITED SOLAR OVONIC LLC

Method and apparatus for the laser scribing of ultra lightweight semiconductor devices

UNIV NORTH TEXAS

Fluorinated metal-organic frameworks for gas storage

OMARY MOHAMMAD A

Fluorinated metal-organic frameworks for hydrocarbon storage

OREAL

Composition for dyeing keratin fibres and use thereof

MICROSOFT TECHNOLOGY LICENSING LLC

Distributed histogram computation framework using data stream sketches and samples