Inventor
SREENIVASAN RAGHAVASIMHAN
US39 patents
⚠️ This page may combine multiple inventors who share the name “SREENIVASAN RAGHAVASIMHAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
26 patentsUS8728927B1May 20, 2014
Borderless contacts for semiconductor transistors
IBM21 citations92
US8697536B1Apr 15, 2014
Locally isolated protected bulk finfet semiconductor device
IBM16 citations92
US9269792B2Feb 23, 2016
Method and structure for robust finFET replacement metal gate integration
IBM17 citations84
US9190487B2Nov 17, 2015
Prevention of fin erosion for semiconductor devices
IBM9 citations84
US8872172B2Oct 28, 2014
Embedded source/drains with epitaxial oxide underlayer
IBM16 citations84
US8809920B2Aug 19, 2014
Prevention of fin erosion for semiconductor devices
IBM6 citations84
US8679885B1Mar 25, 2014
Self-aligned biosensors with enhanced sensitivity
IBM7 citations84
US10475886B2Nov 12, 2019
Modified fin cut after epitaxial growth
IBM2 citations73
US9105606B2Aug 11, 2015
Self aligned contact with improved robustness
IBM5 citations73
US9087796B2Jul 21, 2015
Semiconductor fabrication method using stop layer
IBM4 citations73
US9368343B1Jun 14, 2016
Reduced external resistance finFET device
IBM2 citations63
US9059253B2Jun 16, 2015
Self-aligned contacts for replacement metal gate transistors
IBM3 citations63
US8975675B2Mar 10, 2015
Locally isolated protected bulk FinFET semiconductor device
IBM1 citations63
US9793379B2Oct 17, 2017
FinFET spacer without substrate gouging or spacer foot
IBM0 citations52
US9496282B2Nov 15, 2016
Structure and method to reduce crystal defects in epitaxial fin merge using nitride deposition
IBM1 citations52
US9472576B2Oct 18, 2016
Structure and method to reduce crystal defects in epitaxial fin merge using nitride deposition
IBM1 citations52
US9391069B1Jul 12, 2016
MIM capacitor with enhanced capacitance formed by selective epitaxy
IBM0 citations52
US9312273B2Apr 12, 2016
Structure and method to reduce crystal defects in epitaxial fin merge using nitride deposition
IBM0 citations52
US9299617B2Mar 29, 2016
Locally isolated protected bulk FinFET semiconductor device
IBM0 citations52
US9105663B1Aug 11, 2015
FinFET with silicon germanium stressor and method of forming
IBM0 citations52
US9059242B2Jun 16, 2015
FinFET semiconductor device having increased gate height control
IBM1 citations52
US8896032B2Nov 25, 2014
Self-aligned biosensors with enhanced sensitivity
IBM1 citations52
US8884344B2Nov 11, 2014
Self-aligned contacts for replacement metal gate transistors
IBM1 citations52
US8865561B2Oct 21, 2014
Back-gated substrate and semiconductor device, and related method of fabrication
IBM1 citations52
US9653573B2May 16, 2017
Replacement metal gate including dielectric gate material
IBM0 citations42
US9331073B2May 3, 2016
Epitaxially grown quantum well finFETs for enhanced pFET performance
IBM0 citations40
GLOBALFOUNDRIES INC
7 patentsUS9281198B2Mar 8, 2016
Method of fabricating a semiconductor device including embedded crystalline back-gate bias planes
GLOBALFOUNDRIES INC6 citations84
US9379135B2Jun 28, 2016
FinFET semiconductor device having increased gate height control
GLOBALFOUNDRIES INC2 citations63
US9257536B2Feb 9, 2016
FinFET with crystalline insulator
GLOBALFOUNDRIES INC2 citations63
US9224607B2Dec 29, 2015
Dual epitaxy region integration
GLOBALFOUNDRIES INC2 citations63
US9728649B2Aug 8, 2017
Semiconductor device including embedded crystalline back-gate bias planes, related design structure and method of fabrication
GLOBALFOUNDRIES INC0 citations52
US9417501B2Aug 16, 2016
Electrically controlled optical fuse and method of fabrication
GLOBALFOUNDRIES INC0 citations52
US9214397B2Dec 15, 2015
Structure and method to modulate threshold voltage for high-K metal gate field effect transistors (FETs)
GLOBALFOUNDRIES INC0 citations52