P

Inventor

SREENIVASAN RAGHAVASIMHAN

US39 patents
⚠️ This page may combine multiple inventors who share the name “SREENIVASAN RAGHAVASIMHAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IBM

26 patents
US8728927B1May 20, 2014

Borderless contacts for semiconductor transistors

IBM21 citations92
US8697536B1Apr 15, 2014

Locally isolated protected bulk finfet semiconductor device

IBM16 citations92
US9269792B2Feb 23, 2016

Method and structure for robust finFET replacement metal gate integration

IBM17 citations84
US9190487B2Nov 17, 2015

Prevention of fin erosion for semiconductor devices

IBM9 citations84
US8872172B2Oct 28, 2014

Embedded source/drains with epitaxial oxide underlayer

IBM16 citations84
US8809920B2Aug 19, 2014

Prevention of fin erosion for semiconductor devices

IBM6 citations84
US8679885B1Mar 25, 2014

Self-aligned biosensors with enhanced sensitivity

IBM7 citations84
US10475886B2Nov 12, 2019

Modified fin cut after epitaxial growth

IBM2 citations73
US9105606B2Aug 11, 2015

Self aligned contact with improved robustness

IBM5 citations73
US9087796B2Jul 21, 2015

Semiconductor fabrication method using stop layer

IBM4 citations73
US9368343B1Jun 14, 2016

Reduced external resistance finFET device

IBM2 citations63
US9059253B2Jun 16, 2015

Self-aligned contacts for replacement metal gate transistors

IBM3 citations63
US8975675B2Mar 10, 2015

Locally isolated protected bulk FinFET semiconductor device

IBM1 citations63
US9793379B2Oct 17, 2017

FinFET spacer without substrate gouging or spacer foot

IBM0 citations52
US9496282B2Nov 15, 2016

Structure and method to reduce crystal defects in epitaxial fin merge using nitride deposition

IBM1 citations52
US9472576B2Oct 18, 2016

Structure and method to reduce crystal defects in epitaxial fin merge using nitride deposition

IBM1 citations52
US9391069B1Jul 12, 2016

MIM capacitor with enhanced capacitance formed by selective epitaxy

IBM0 citations52
US9312273B2Apr 12, 2016

Structure and method to reduce crystal defects in epitaxial fin merge using nitride deposition

IBM0 citations52
US9299617B2Mar 29, 2016

Locally isolated protected bulk FinFET semiconductor device

IBM0 citations52
US9105663B1Aug 11, 2015

FinFET with silicon germanium stressor and method of forming

IBM0 citations52
US9059242B2Jun 16, 2015

FinFET semiconductor device having increased gate height control

IBM1 citations52
US8896032B2Nov 25, 2014

Self-aligned biosensors with enhanced sensitivity

IBM1 citations52
US8884344B2Nov 11, 2014

Self-aligned contacts for replacement metal gate transistors

IBM1 citations52
US8865561B2Oct 21, 2014

Back-gated substrate and semiconductor device, and related method of fabrication

IBM1 citations52
US9653573B2May 16, 2017

Replacement metal gate including dielectric gate material

IBM0 citations42
US9331073B2May 3, 2016

Epitaxially grown quantum well finFETs for enhanced pFET performance

IBM0 citations40

GLOBALFOUNDRIES INC

7 patents

CHENG KANGGUO

2 patents

HARTIG MICHAEL J

1 patent

GLOBAL FOUNDRIES U S 2 LLC

1 patent

RENESAS ELECTRONICS CORP

1 patent

DORIS BRUCE B

1 patent