Inventor
JIA SHENA
CN10 patents
Patents
10 patentsUS10297472B2May 21, 2019
Method and apparatus for cleaning semiconductor wafer
ACM RESEARCH SHANGHAI INC5 citations72
US11498100B2Nov 15, 2022
Apparatus for cleaning semiconductor substrates
ACM RESEARCH SHANGHAI INC0 citations62
US11462423B2Oct 4, 2022
Method and apparatus for cleaning semiconductor wafer
ACM RESEARCH SHANGHAI INC0 citations62
US12186684B2Jan 7, 2025
Method and apparatus for cleaning substrates using high temperature chemicals and ultrasonic device
ACM RESEARCH SHANGHAI INC0 citations58
US11925881B2Mar 12, 2024
Method and apparatus for cleaning substrates using high temperature chemicals and ultrasonic device
ACM RESEARCH SHANGHAI INC0 citations58
US11000782B2May 11, 2021
Method and apparatus for cleaning substrates using high temperature chemicals and ultrasonic device
ACM RESEARCH SHANGHAI INC0 citations58
US12544807B2Feb 10, 2026
Wafer cleaning apparatus
ACM RESEARCH SHANGHAI INC0 citations56
US12482697B2Nov 25, 2025
Substrate supporting apparatus
ACM RESEARCH SHANGHAI INC0 citations51
US10770315B2Sep 8, 2020
Fall-proof apparatus for cleaning semiconductor devices and a chamber with the apparatus
ACM RESEARCH SHANGHAI INC0 citations50
US12334367B2Jun 17, 2025
Method and apparatus for removing particles or photoresist on substrates
ACM RESEARCH SHANGHAI INC0 citations49