Inventor
YAMADA MOTOYUKI
JP21 patents
Patents
21 patentsUS4358306ANov 9, 1982
Method for molding a fused quartz glass block
SHINETSU CHEMICAL CO53 citations95
US4849196AJul 18, 1989
Process for producing silicon carbide whiskers
SHINETSU CHEMICAL CO57 citations94
US4981666AJan 1, 1991
Method for the preparation of silicon carbide whiskers
SHINETSU CHEMICAL CO33 citations92
US7585598B2Sep 8, 2009
Titania-doped quartz glass and making method, EUV lithographic member and photomask substrate
SHINETSU CHEMICAL CO11 citations83
US5618892AApr 8, 1997
2,4-diamino-s-triazinyl group-containing polymer and negative radiation-sensitive resist composition containing the same
SHINETSU CHEMICAL CO16 citations82
US5219681AJun 15, 1993
Lithium cell
SHINETSU CHEMICAL CO20 citations82
US5523370AJun 4, 1996
Poly(para-T-butoxycarbonyloxystyrene) and method of making
SHINETSU CHEMICAL CO7 citations74
US5356753AOct 18, 1994
Positive resist material
SHINETSU CHEMICAL CO8 citations74
US5314931AMay 24, 1994
Resist compositions
SHINETSU CHEMICAL CO11 citations74
US9195130B2Nov 24, 2015
Pellicle for EUV
SHINETSU CHEMICAL CO6 citations73
US6339940B1Jan 22, 2002
Synthetic quartz glass manufacturing process
SHINETSU CHEMICAL CO7 citations73
US5412050AMay 2, 1995
Polymer having a narrow dispersion of molecular weight and a manufacturing process thereof
SHINETSU CHEMICAL CO7 citations73
US4432781AFeb 21, 1984
Method for manufacturing fused quartz glass
SHINETSU CHEMICAL CO15 citations73
US4975392ADec 4, 1990
Method for manufacturing silicon carbide whisker
SHINETSU CHEMICAL CO13 citations71
US6744458B2Jun 1, 2004
Internally marked quartz glass, quartz glass substrate for optical member, and marking method
SHINETSU CHEMICAL CO11 citations66
US9405184B2Aug 2, 2016
Pellicle for EUV, and an assembly including the pellicle, and a method for assembling the same
SHINETSU CHEMICAL CO2 citations63
US5252691AOct 12, 1993
P-vinylphenoxydimethylphenylcarbyldimethylsilane homopolymer
SHINETSU CHEMICAL CO5 citations63
US6990836B2Jan 31, 2006
Method of producing fluorine-containing synthetic quartz glass
SHINETSU CHEMICAL CO6 citations62
US5668226ASep 16, 1997
2,4-diamino-s-triazinyl group-containing polymer and negative radiation-sensitive resist composition containing the same
SHINETSU CHEMICAL CO1 citations52
US9225010B2Dec 29, 2015
Silicon-containing particles, negative electrode material for nonaqueous electrolyte secondary battery using the same, nonaqueous electrolyte secondary battery, and method of manufacturing silicon-containing particles
SHINETSU CHEMICAL CO0 citations51
US7849711B2Dec 14, 2010
Titania-doped quartz glass and making method, EUV lithographic member and photomask substrate
SHINETSU CHEMICAL CO0 citations51