Inventor

KIMURA YOSHIE

US20 patents

⚠️ This page may combine multiple inventors who share the name “KIMURA YOSHIE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KIMURA YOSHIE

LAM RES CORP

Air gap spacer integration for improved fin device performance

Atomic layer deposition and etch in a single plasma chamber for critical dimension control

Atomic layer deposition and etch in a single plasma chamber for critical dimension control

Controlling CD and CD uniformity with trim time and temperature on a wafer by wafer basis

Internal plasma grid applications for semiconductor fabrication

Internal plasma grid applications for semiconductor fabrication in context of ion-ion plasma processing

Integrated atomic layer passivation in TCP etch chamber and in-situ etch-ALP method

Controlling CD and CD uniformity with trim time and temperature on a wafer by wafer basis

Reducing roughness of extreme ultraviolet lithography resists

Gas delivery system

Atomic layer deposition and etch for reducing roughness

Atomic layer deposition and etch in a single plasma chamber for fin field effect transistor formation

Synchronization of RF generators

Synchronization of RF generators

Method for etching features using a targeted deposition for selective passivation

Atomic layer deposition and etch for reducing roughness

Method of planarizing an upper surface of a semiconductor substrate in a plasma etch chamber

FUJITSU LTD

Computer-readable recording medium storing label change program, label change method, and information processing apparatus

Distance measuring device, distance measuring method, and non-transitory computer-readable storage medium for storing program

ZHONG QINGHUA

Silicon nitride dry trim without top pulldown