Inventor

DELGADINO GERARDO A

US17 patents

⚠️ This page may combine multiple inventors who share the name “DELGADINO GERARDO A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

DELGADINO GERARDO A

APPLIED MATERIALS INC

Capacitively coupled plasma reactor with uniform radial distribution of plasma

Method for modifying dielectric characteristics of dielectric layers

Method of forming a low-K dual damascene interconnect structure

Selective etch process of a sacrificial light absorbing material (SLAM) over a dielectric material

Plasma dielectric etch process including ex-situ backside polymer removal for low-dielectric constant material

Plasma dielectric etch process including in-situ backside polymer removal for low-dielectric constant material

Method of forming a low-K dual damascene interconnect structure

Selective etch process of a sacrificial light absorbing material (SLAM) over a dielectric material

Organic BARC etch process capable of use in the formation of low K dual damascene integrated circuits

Plasma etch and photoresist strip process with intervening chamber de-fluorination and wafer de-fluorination steps

Methods to avoid unstable plasma states during a process transition

Methods for etching a dielectric barrier layer with high selectivity

Two step etching of a bottom anti-reflective coating layer in dual damascene application

DELGADINO GERARDO A

Removal of process residues on the backside of a substrate

Bi-layer, tri-layer mask CD control

LAM RES CORP

Air gap spacer integration for improved fin device performance

JI BING

Method for low-K dielectric etch with reduced damage