Inventor
LUKAS AARON SCOTT
US18 patents
⚠️ This page may combine multiple inventors who share the name “LUKAS AARON SCOTT”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
AIR PROD & CHEM
13 patentsUS6846515B2Jan 25, 2005
Methods for using porogens and/or porogenated precursors to provide porous organosilica glass films with low dielectric constants
AIR PROD & CHEM667 citations99
US7332445B2Feb 19, 2008
Porous low dielectric constant compositions and methods for making and using same
AIR PROD & CHEM65 citations98
US7098149B2Aug 29, 2006
Mechanical enhancement of dense and porous organosilicate materials by UV exposure
AIR PROD & CHEM624 citations98
US7404990B2Jul 29, 2008
Non-thermal process for forming porous low dielectric constant films
AIR PROD & CHEM47 citations96
US7468290B2Dec 23, 2008
Mechanical enhancement of dense and porous organosilicate materials by UV exposure
AIR PROD & CHEM33 citations92
US7384471B2Jun 10, 2008
Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants
AIR PROD & CHEM28 citations92
US7943195B2May 17, 2011
Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants
AIR PROD & CHEM8 citations84
US7932188B2Apr 26, 2011
Mechanical enhancement of dense and porous organosilicate materials by UV exposure
AIR PROD & CHEM9 citations84
US7470454B2Dec 30, 2008
Non-thermal process for forming porous low dielectric constant films
AIR PROD & CHEM14 citations84
US7581549B2Sep 1, 2009
Method for removing carbon-containing residues from a substrate
AIR PROD & CHEM18 citations83
US7074489B2Jul 11, 2006
Low dielectric constant material and method of processing by CVD
AIR PROD & CHEM7 citations73
US8846522B2Sep 30, 2014
Materials and methods of forming controlled void
AIR PROD & CHEM1 citations52
US9293361B2Mar 22, 2016
Materials and methods of forming controlled void
AIR PROD & CHEM0 citations51
VRTIS RAYMOND NICHOLAS
4 patentsUS8399349B2Mar 19, 2013
Materials and methods of forming controlled void
VRTIS RAYMOND NICHOLAS13 citations83
US9061317B2Jun 23, 2015
Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants
VRTIS RAYMOND NICHOLAS8 citations79
US8293001B2Oct 23, 2012
Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants
VRTIS RAYMOND NICHOLAS6 citations72
US8951342B2Feb 10, 2015
Methods for using porogens for low k porous organosilica glass films
VRTIS RAYMOND NICHOLAS5 citations71