Inventor

KUME FUMITAKA

JP14 patents

⚠️ This page may combine multiple inventors who share the name “KUME FUMITAKA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NETSU SHIGEYOSHI

5 patents

US9193596B2Nov 24, 2015

Reactor for producing polycrystalline silicon, system for producing polycrystalline silicon, and process for producing polycrystalline silicon

NETSU SHIGEYOSHI2 citations60

US9017482B2Apr 28, 2015

System for producing polycrystalline silicon, apparatus for producing polycrystalline silicon, and process for producing polycrystalline silicon

NETSU SHIGEYOSHI2 citations60

US9006002B2Apr 14, 2015

Polycrystalline silicon rod and method for manufacturing polycrystalline silicon rod

NETSU SHIGEYOSHI2 citations60

US8793853B2Aug 5, 2014

Core wire holder for producing polycrystalline silicon and method for producing polycrystalline silicon

NETSU SHIGEYOSHI1 citations48

US9562289B2Feb 7, 2017

Carbon electrode with slidable contact surfaces and apparatus for manufacturing polycrystalline silicon rod

NETSU SHIGEYOSHI0 citations34

SHINETSU HANDOTAI KK

5 patents

US7811464B2Oct 12, 2010

Preferential etching method and silicon single crystal substrate

SHINETSU HANDOTAI KK2 citations60

US7867803B2Jan 11, 2011

Method of fabricating light emitting device and compound semiconductor wafer and light emitting device

SHINETSU HANDOTAI KK0 citations51

US7713851B2May 11, 2010

Method of manufacturing silicon epitaxial wafer

SHINETSU HANDOTAI KK1 citations48

US10073126B2Sep 11, 2018

C-V characteristic measurement system and method for measuring C-V characteristics

SHINETSU HANDOTAI KK1 citations41

US10720366B2Jul 21, 2020

Method for manufacturing resistivity standard sample and method for measuring resistivity of epitaxial wafer

SHINETSU HANDOTAI KK0 citations39

SHINETSU CHEMICAL CO

2 patents

US11440804B2Sep 13, 2022

Process for producing polycrystalline silicon mass

SHINETSU CHEMICAL CO0 citations62

US10366882B2Jul 30, 2019

System for producing polycrystalline silicon, apparatus for producing polycrystalline silicon, and process for producing polycrystalline silicon

SHINETSU CHEMICAL CO0 citations51

KUME FUMITAKA

1 patent

US9287111B2Mar 15, 2016

Ozone gas generation processing apparatus, method of forming silicon oxide film, and method for evaluating silicon single crystal wafer

KUME FUMITAKA0 citations43

OKADA JUNICHI

1 patent

US8963070B2Feb 24, 2015

Method for measuring carbon concentration in polycrystalline silicon

OKADA JUNICHI0 citations34