Inventor
WU HANMING
CN18 patents
⚠️ This page may combine multiple inventors who share the name “WU HANMING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SEMICONDUCTOR MFG INT SHANGHAI
5 patentsUS7709336B2May 4, 2010
Metal hard mask method and structure for strained silicon MOS transistors
SEMICONDUCTOR MFG INT SHANGHAI8 citations84
US7591659B2Sep 22, 2009
Method and structure for second spacer formation for strained silicon MOS transistors
SEMICONDUCTOR MFG INT SHANGHAI9 citations84
US7425488B2Sep 16, 2008
Method and structure using a pure silicon dioxide hardmask for gate patterning for strained silicon MOS transistors
SEMICONDUCTOR MFG INT SHANGHAI12 citations84
US7557000B2Jul 7, 2009
Etching method and structure using a hard mask for strained silicon MOS transistors
SEMICONDUCTOR MFG INT SHANGHAI8 citations80
US9024281B2May 5, 2015
Method for dual energy implantation for ultra-shallow junction formation of MOS devices
SEMICONDUCTOR MFG INT SHANGHAI0 citations52
SEMICONDUCTOR MFG INT SHANGHAI CORP
4 patentsUS10515892B2Dec 24, 2019
TSV interconnect structure and manufacturing method thereof
SEMICONDUCTOR MFG INT SHANGHAI CORP2 citations70
US9590031B2Mar 7, 2017
Fin-type field effect transistor and manufacturing method thereof
SEMICONDUCTOR MFG INT SHANGHAI CORP2 citations68
US10128117B2Nov 13, 2018
Semiconductor device, related manufacturing method, and related electronic device
SEMICONDUCTOR MFG INT SHANGHAI CORP0 citations52
US9799525B2Oct 24, 2017
Semiconductor device, related manufacturing method, and related electronic device
SEMICONDUCTOR MFG INT SHANGHAI CORP0 citations52