Inventor

PENG JUI-CHUN

TW27 patents

⚠️ This page may combine multiple inventors who share the name “PENG JUI-CHUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

PENG JUI-CHUN

TAIWAN SEMICONDUCTOR MFG CO LTD

Synchronized integrated metrology for overlay-shift reduction

Overlay abnormality gating by Z data

Exposure method and exposure apparatus

EUV collector with orientation to avoid contamination

Semiconductor wafer cooling

Semiconductor wafer cooling

Apparatus and method for generating an electromagnetic radiation

Exposure method and exposure apparatus

Wafer alignment mark scheme

Wafer alignment mark scheme

Patterning method and patterning apparatus for fabricating a resist pattern

Wafer alignment mark scheme

Lithography apparatus having dual reticle edge masking assemblies and method of use

Wafer alignment mark scheme

Focus metrology method and photolithography method and system

Exposure method and exposure apparatus

In-line inspection and clean for immersion lithography

Method of heating/cooling a substrate

Semiconductor method and associated apparatus

Flexible wafer leveling design for various orientation of line/trench

PENG JUI-CHUN

System and method for cleaning a wafer chuck

Method and apparatus for reducing down time of a lithography system

In-situ immersion hood cleaning

Rotatable heating-cooling plate and element in proximity thereto

TSENG WEI-HSIANG

Track spin wafer chuck

WU TUNG-LI

Lithography apparatus having dual reticle edge masking assemblies and method of use

LEE HENG-JEN

Dual wavelength exposure method and system for semiconductor device manufacturing