Inventor

LIU HENG-HSIN

TW135 patents

⚠️ This page may combine multiple inventors who share the name “LIU HENG-HSIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LIU HENG-HSIN

TAIWAN SEMICONDUCTOR MFG CO LTD

Synchronized integrated metrology for overlay-shift reduction

Semiconductor processing tool and methods of operation

System and method for dynamically controlling temperature of thermostatic reticles

Lithography apparatus and method

System and method for omnidirectional real time detection of photolithography characteristics

Method and apparatus for mitigating tin debris

Methods of cleaning a lithography system

System and method for detecting debris in a photolithography system

Lithography contamination control

Lithography apparatus and method for using the same

Particle removal device and method

System and method for performing extreme ultraviolet photolithography processes

Radiation source apparatus and method for using the same

System and method for supplying target material in an EUV light source

System and method for performing extreme ultraviolet photolithography processes

Overlay abnormality gating by Z data

EUV photolithography system fuel source and methods of operating the same

Substrate stage, substrate processing system using the same, and method for processing substrate

Highly efficient automatic particle cleaner method for EUV systems

Exposure method and exposure apparatus

Mitigating long-term energy decay of laser devices

Semiconductor processing tool and methods of operation

Detection of defects on wafer during semiconductor fabrication

System and method for omnidirectional real time detection of photolithography characteristics

Semiconductor processing tool and methods of operation

Lithography system and methods

Lithography system and methods

EUV light source contamination monitoring system

EUV lithography apparatus

System and method for monitoring and controlling extreme ultraviolet photolithography processes

Semiconductor processing tool and methods of operation

EUV lithography apparatus

Litho cluster and modulization to enhance productivity

Lithography contamination control

EUV lithography system with 3D sensing and tunning modules

Semiconductor processing tool and methods of operation

Semiconductor processing tool and methods of operation

Semiconductor processing tool and method of using the same

Lithography apparatus and method

Methods of cleaning a lithography system

Inspection system for extreme ultraviolet (EUV) light source

System and method for detecting debris in a photolithography system

Semiconductor processing tool and methods of operation

TAIWAN SEMICONDUCTOR MFG

Method of monitoring and controlling a silicon nitride etch step

Method for polymer removal after etching

SHIH CHI-YUAN

Overlay alignment mark and method of detecting overlay alignment error using the mark

Structure of stacking scatterometry based overlay marks for marks footprint reduction

PENG JUI-CHUNG

System and method for improving immersion scanner overlay performance

System and method for improving immersion scanner overlay performance

LEE YUNG-YAO

Lithography process