P

Inventor

OGAWA TAKUZO

20 patents

Patents

20 patents
US4290830ASep 22, 1981

Method of selectively diffusing aluminium into a silicon semiconductor substrate

HITACHI LTD42 citations92
US4223328ASep 16, 1980

Field controlled thyristor with dual resistivity field layer

HITACHI LTD42 citations92
US4193826AMar 18, 1980

Vapor phase diffusion of aluminum with or without boron

HITACHI LTD35 citations92
US4100310AJul 11, 1978

Method of doping inpurities

HITACHI LTD53 citations92
US4058821ANov 15, 1977

Photo-coupler semiconductor device and method of manufacturing the same

HITACHI LTD36 citations92
US4016593AApr 5, 1977

Bidirectional photothyristor device

HITACHI LTD28 citations82
US4079405AMar 14, 1978

Semiconductor photodetector

HITACHI LTD26 citations79
US4354121AOct 12, 1982

Field controlled thyristor control circuit with additional FCT in reverse bias circuit

HITACHI LTD10 citations74
US4146906AMar 27, 1979

Low forward voltage drop semiconductor device having polycrystalline layers of different resistivity

HITACHI LTD14 citations74
US4136351AJan 23, 1979

Photo-coupled semiconductor device

HITACHI LTD14 citations74
US4040084AAug 2, 1977

Semiconductor device having high blocking voltage with peripheral circular groove

HITACHI LTD16 citations74
US3978514AAug 31, 1976

Diode-integrated high speed thyristor

HITACHI LTD16 citations74
US3967308AJun 29, 1976

Semiconductor controlled rectifier

HITACHI LTD9 citations74
US3943547AMar 9, 1976

Semiconductor device

HITACHI LTD19 citations74
US4262295AApr 14, 1981

Semiconductor device

HITACHI LTD14 citations73
US4200877AApr 29, 1980

Temperature-compensated voltage reference diode with intermediate polycrystalline layer

HITACHI LTD17 citations73
US4210464AJul 1, 1980

Method of simultaneously controlling the lifetimes and leakage currents in semiconductor devices by hot electron irradiation through passivating glass layers

HITACHI LTD14 citations72
US4164436AAug 14, 1979

Process for preparation of semiconductor devices utilizing a two-step polycrystalline deposition technique to form a diffusion source

HITACHI LTD6 citations63
US3943550AMar 9, 1976

Light-activated semiconductor-controlled rectifier

HITACHI LTD2 citations63
US4219832AAug 26, 1980

Thyristor having low on-state voltage with low areal doping emitter region

HITACHI LTD5 citations62