Inventor

NOJIMA SHIGEKI

JP37 patents

⚠️ This page may combine multiple inventors who share the name “NOJIMA SHIGEKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NOJIMA SHIGEKI

TOSHIBA KK

Design layout preparing method

Method for exposure-mask inspection and recording medium on which a program for searching for portions to be measured is recorded

Method and system for correcting a mask pattern design

Semiconductor integrated circuit pattern verification method, photomask manufacturing method, semiconductor integrated circuit device manufacturing method, and program for implementing semiconductor integrated circuit pattern verification method

Method of manufacturing photomask

Parameter adjustment method, semiconductor device manufacturing method, and recording medium

Design pattern data preparing method, mask pattern data preparing method, mask manufacturing method, semiconductor device manufacturing method, and program recording medium

Pattern correcting method, mask making method, method of manufacturing semiconductor device, pattern correction system, and computer-readable recording medium having pattern correction program recorded therein

Pattern dimension correction method and verification method using OPC, mask and semiconductor device fabricated by using the correction method, and system and software product for executing the correction method

Method of manufacturing a photo mask and method of manufacturing a semiconductor device

Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor device

Pattern data correction method, pattern checking method, pattern check program, photo mask producing method, and semiconductor device manufacturing method

Semiconductor integrated circuit patterns

Method of manufacturing a photomask and method of manufacturing a semiconductor device using the photomask

Semiconductor integrated circuit pattern verification method, photomask manufacturing method, semiconductor integrated circuit device manufacturing method, and program for implementing semiconductor integrated circuit pattern verification method

Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing method

Mask pattern preparation method, semiconductor device manufacturing method and recording medium

Pattern data verification method for semiconductor device, computer-readable recording medium having pattern data verification program for semiconductor device recorded, and semiconductor device manufacturing method

Method of forming a resist pattern

Pattern data verification method, pattern data creation method, exposure mask manufacturing method, semiconductor device manufacturing method, and computer program product

Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor device

Method for evaluating photo mask and method for manufacturing semiconductor device

Apparatus for correcting a plurality of exposure tools, method for correcting a plurality of exposure tools, and method for manufacturing semiconductor device

Method for verifying mask pattern data, method for manufacturing mask, mask pattern verification program, and method for manufacturing semiconductor device

Lithography simulation method and recording medium

Design Pattern correcting method, process proximity effect correcting method, and semiconductor device manufacturing method

Integrated circuit pattern designing method, exposure mask manufacturing method, exposure mask, and integrated circuit device manufacturing method

TOSHIBA MEMORY CORP

Method of wiring layout, semiconductor device, program for supporting design of wiring layout, and method for manufacturing semiconductor device

Method of wiring layout, semiconductor device, program for supporting design of wiring layout, and method for manufacturing semiconductor device

Defect inspection apparatus and defect inspection method

Mold and mold manufacturing method

NOJIMA SHIGEKI

Semiconductor integrated circuit pattern verification method, photomask manufacturing method, semiconductor integrated circuit device manufacturing method, and program for implementing semiconductor integrated circuit pattern verification method

Pattern shape determining method, pattern shape verifying method, and pattern correcting method

Dimension assurance of mask using plurality of types of pattern ambient environment

IZUHA KYOKO

Method and system for correcting a mask pattern design

KOTANI TOSHIYA

Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing method

KODAMA CHIKAAKI

Sub-resolution assist feature arranging method and computer program product and manufacturing method of semiconductor device