Inventor
LOOPSTRA ERIK
DE14 patents
⚠️ This page may combine multiple inventors who share the name “LOOPSTRA ERIK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
5 patentsUS10908508B2Feb 2, 2021
Position measurement of optical elements in a lithographic apparatus
ZEISS CARL SMT GMBH1 citations59
US10509325B2Dec 17, 2019
Position measurement of optical elements in a lithographic apparatus
ZEISS CARL SMT GMBH1 citations59
US12117731B2Oct 15, 2024
Method for producing a mirror of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations55
US10599051B2Mar 24, 2020
Projection exposure apparatus, and method for reducing deformations, resulting from dynamic accelerations, of components of the projection exposure apparatus
ZEISS CARL SMT GMBH0 citations51
US12372884B2Jul 29, 2025
Device for positioning and holding at least one optical element, measurement system
ZEISS CARL SMT GMBH0 citations44
ASML HOLDING NV
3 patentsUS7136214B2Nov 14, 2006
Active faceted mirror system for lithography
ASML HOLDING NV8 citations73
US7119883B2Oct 10, 2006
Correcting variations in the intensity of light within an illumination field without distorting the telecentricity of the light
ASML HOLDING NV6 citations73
US7633599B2Dec 15, 2009
Apparatuses and methods for changing an intensity distribution of light within an illumination field without distorting the telecentricity of the light
ASML HOLDING NV0 citations51