Inventor
DAI HUIXIONG
US44 patents
⚠️ This page may combine multiple inventors who share the name “DAI HUIXIONG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
34 patentsUS9761489B2Sep 12, 2017
Self-aligned interconnects formed using substractive techniques
APPLIED MATERIALS INC20 citations92
US9748148B2Aug 29, 2017
Localized stress modulation for overlay and EPE
APPLIED MATERIALS INC8 citations84
US9716012B2Jul 25, 2017
Methods of selective layer deposition
APPLIED MATERIALS INC15 citations84
US9478421B2Oct 25, 2016
Optically tuned hardmask for multi-patterning applications
APPLIED MATERIALS INC6 citations84
US9411237B2Aug 9, 2016
Resist hardening and development processes for semiconductor device manufacturing
APPLIED MATERIALS INC11 citations84
US9177796B2Nov 3, 2015
Optically tuned hardmask for multi-patterning applications
APPLIED MATERIALS INC7 citations84
US8357618B2Jan 22, 2013
Frequency doubling using a photo-resist template mask
APPLIED MATERIALS INC9 citations84
US10234772B2Mar 19, 2019
Overlay error correction
APPLIED MATERIALS INC5 citations80
US11437284B2Sep 6, 2022
Contact over active gate structure
APPLIED MATERIALS INC2 citations73
US10930555B2Feb 23, 2021
Contact over active gate structure
APPLIED MATERIALS INC2 citations73
US10643895B2May 5, 2020
Self-aligned interconnects formed using subtractive techniques
APPLIED MATERIALS INC5 citations73
US9815091B2Nov 14, 2017
Roll to roll wafer backside particle and contamination removal
APPLIED MATERIALS INC2 citations73
US9728406B2Aug 8, 2017
Multi materials and selective removal enabled reverse tone process
APPLIED MATERIALS INC4 citations73
US11429026B2Aug 30, 2022
Lithography process window enhancement for photoresist patterning
APPLIED MATERIALS INC2 citations72
US9343309B1May 17, 2016
Lateral oxidation process flows
APPLIED MATERIALS INC5 citations68
US12372874B2Jul 29, 2025
System architecture of manufacturing of semiconductor wafers
APPLIED MATERIALS INC0 citations62
US12201030B2Jan 14, 2025
Spin-orbit torque MRAM structure and manufacture thereof
APPLIED MATERIALS INC0 citations62
US12198985B2Jan 14, 2025
Contact over active gate structure
APPLIED MATERIALS INC0 citations62
US11723283B2Aug 8, 2023
Spin-orbit torque MRAM structure and manufacture thereof
APPLIED MATERIALS INC0 citations62
US10957590B2Mar 23, 2021
Method for forming a layer
APPLIED MATERIALS INC0 citations62
US10930556B2Feb 23, 2021
Contact over active gate structure
APPLIED MATERIALS INC1 citations62
US9337051B2May 10, 2016
Method for critical dimension reduction using conformal carbon films
APPLIED MATERIALS INC2 citations62
US7901869B2Mar 8, 2011
Double patterning with a double layer cap on carbonaceous hardmask
APPLIED MATERIALS INC4 citations62
US11914299B2Feb 27, 2024
Lithography process window enhancement for photoresist patterning
APPLIED MATERIALS INC0 citations61
US11650506B2May 16, 2023
Film structure for electric field guided photoresist patterning process
APPLIED MATERIALS INC0 citations61
US10825665B2Nov 3, 2020
Directional treatment for multi-dimensional device processing
APPLIED MATERIALS INC1 citations61
US11880137B2Jan 23, 2024
Film structure for electric field guided photoresist patterning process
APPLIED MATERIALS INC0 citations60
US10927451B2Feb 23, 2021
Methods and apparatus for patterning substrates using asymmetric physical vapor deposition
APPLIED MATERIALS INC0 citations52
US11313034B2Apr 26, 2022
Methods for depositing amorphous silicon layers or silicon oxycarbide layers via physical vapor deposition
APPLIED MATERIALS INC0 citations51
US10927450B2Feb 23, 2021
Methods and apparatus for patterning substrates using asymmetric physical vapor deposition
APPLIED MATERIALS INC0 citations51
US12204246B2Jan 21, 2025
Metal oxide resist patterning with electrical field guided post-exposure bake
APPLIED MATERIALS INC0 citations50
US12085858B2Sep 10, 2024
Photoresist patterning process
APPLIED MATERIALS INC0 citations50
US9864280B2Jan 9, 2018
Overlay error correction
APPLIED MATERIALS INC1 citations48
US11609505B2Mar 21, 2023
Apparatus and methods for verification and re-use of process fluids
APPLIED MATERIALS INC0 citations46
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC
8 patentsUS11488823B2Nov 1, 2022
Techniques to engineer nanoscale patterned features using ions
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC4 citations84
US11043380B2Jun 22, 2021
Techniques to engineer nanoscale patterned features using ions
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC7 citations84
US10008384B2Jun 26, 2018
Techniques to engineer nanoscale patterned features using ions
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC6 citations84
US9984889B2May 29, 2018
Techniques for manipulating patterned features using ions
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC11 citations83
US11908691B2Feb 20, 2024
Techniques to engineer nanoscale patterned features using ions
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC3 citations74
US10381232B2Aug 13, 2019
Techniques for manipulating patterned features using ions
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC2 citations72
US10990014B2Apr 27, 2021
Performance improvement of EUV photoresist by ion implantation
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC0 citations62
US10545408B2Jan 28, 2020
Performance improvement of EUV photoresist by ion implantation
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC0 citations51