Inventor
LOERING ULRICH
DE30 patents
⚠️ This page may combine multiple inventors who share the name “LOERING ULRICH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
17 patentsUS10031423B2Jul 24, 2018
EUV exposure apparatus with reflective elements having reduced influence of temperature variation
ZEISS CARL SMT GMBH4 citations82
US9316929B2Apr 19, 2016
EUV exposure apparatus with reflective elements having reduced influence of temperature variation
ZEISS CARL SMT GMBH10 citations82
US9442381B2Sep 13, 2016
Method of operating a projection exposure tool for microlithography
ZEISS CARL SMT GMBH4 citations73
US8054557B2Nov 8, 2011
Lithography projection objective, and a method for correcting image defects of the same
ZEISS CARL SMT GMBH3 citations73
US9671703B2Jun 6, 2017
Optical arrangement, EUV lithography apparatus and method for configuring an optical arrangement
ZEISS CARL SMT GMBH2 citations72
US9436095B2Sep 6, 2016
Exposure apparatus and measuring device for a projection lens
ZEISS CARL SMT GMBH1 citations62
US9316922B2Apr 19, 2016
Lithography projection objective, and a method for correcting image defects of the same
ZEISS CARL SMT GMBH1 citations62
US12222655B2Feb 11, 2025
Stop, optical system and lithography apparatus
ZEISS CARL SMT GMBH0 citations58
US10241423B2Mar 26, 2019
Method of operating a projection exposure tool for microlithography
ZEISS CARL SMT GMBH0 citations52
US9964859B2May 8, 2018
Lithography projection objective, and a method for correcting image defects of the same
ZEISS CARL SMT GMBH0 citations52
US8659745B2Feb 25, 2014
Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations
ZEISS CARL SMT GMBH1 citations52
US10345710B2Jul 9, 2019
Microlithographic projection exposure apparatus and measuring device for a projection lens
ZEISS CARL SMT GMBH0 citations51
US10684551B2Jun 16, 2020
EUV exposure apparatus with reflective elements having reduced influence of temperature variation
ZEISS CARL SMT GMBH0 citations50
US10317802B2Jun 11, 2019
EUV exposure apparatus with reflective elements having reduced influence of temperature variation
ZEISS CARL SMT GMBH0 citations50
US9746778B2Aug 29, 2017
EUV exposure apparatus with reflective elements having reduced influence of temperature variation
ZEISS CARL SMT GMBH0 citations50
US12405108B2Sep 2, 2025
Production method and measurement method
ZEISS CARL SMT GMBH0 citations48
US9921483B2Mar 20, 2018
Surface correction of mirrors with decoupling coating
ZEISS CARL SMT GMBH1 citations46
ZEISS CARL SMT AG
5 patentsUS7460206B2Dec 2, 2008
Projection objective for immersion lithography
ZEISS CARL SMT AG71 citations95
US7463423B2Dec 9, 2008
Lithography projection objective, and a method for correcting image defects of the same
ZEISS CARL SMT AG9 citations84
US7570343B2Aug 4, 2009
Microlithographic projection exposure apparatus
ZEISS CARL SMT AG14 citations83
US7692868B2Apr 6, 2010
Lithography projection objective, and a method for correcting image defects of the same
ZEISS CARL SMT AG6 citations73
US7697211B2Apr 13, 2010
Symmetrical objective having four lens groups for microlithography
ZEISS CARL SMT AG2 citations62
LOERING ULRICH
4 patentsUS8228483B2Jul 24, 2012
Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate
LOERING ULRICH6 citations70
US8879159B2Nov 4, 2014
Lithography projection objective, and a method for correcting image defects of the same
LOERING ULRICH2 citations61
US9201226B2Dec 1, 2015
Imaging optics
LOERING ULRICH0 citations50
US8339576B2Dec 25, 2012
Projection objective of a microlithographic projection exposure apparatus
LOERING ULRICH1 citations50