Inventor
WITTICH GERO
DE6 patents
Patents
6 patentsUS10031423B2Jul 24, 2018
EUV exposure apparatus with reflective elements having reduced influence of temperature variation
ZEISS CARL SMT GMBH4 citations82
US9316929B2Apr 19, 2016
EUV exposure apparatus with reflective elements having reduced influence of temperature variation
ZEISS CARL SMT GMBH10 citations82
US9575224B2Feb 21, 2017
Mirror, projection objective with such mirror, and projection exposure apparatus for microlithography with such projection objective
ZEISS CARL SMT GMBH3 citations70
US10684551B2Jun 16, 2020
EUV exposure apparatus with reflective elements having reduced influence of temperature variation
ZEISS CARL SMT GMBH0 citations50
US10317802B2Jun 11, 2019
EUV exposure apparatus with reflective elements having reduced influence of temperature variation
ZEISS CARL SMT GMBH0 citations50
US9746778B2Aug 29, 2017
EUV exposure apparatus with reflective elements having reduced influence of temperature variation
ZEISS CARL SMT GMBH0 citations50