Inventor
HEMBACHER STEFAN
DE29 patents
⚠️ This page may combine multiple inventors who share the name “HEMBACHER STEFAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
24 patentsUS10031423B2Jul 24, 2018
EUV exposure apparatus with reflective elements having reduced influence of temperature variation
ZEISS CARL SMT GMBH4 citations82
US9316929B2Apr 19, 2016
EUV exposure apparatus with reflective elements having reduced influence of temperature variation
ZEISS CARL SMT GMBH10 citations82
US9696518B2Jul 4, 2017
Position manipulator for an optical component
ZEISS CARL SMT GMBH4 citations72
US9175948B2Nov 3, 2015
Optical module with a measuring device
ZEISS CARL SMT GMBH4 citations72
US10416570B2Sep 17, 2019
Optical imaging arrangement with a piezoelectric device
ZEISS CARL SMT GMBH3 citations67
US11092897B2Aug 17, 2021
Method for producing a mirror as an optical component for an optical system of a projection exposure apparatus for projection lithography
ZEISS CARL SMT GMBH0 citations62
US8027023B2Sep 27, 2011
Optical imaging device and method for reducing dynamic fluctuations in pressure difference
ZEISS CARL SMT GMBH2 citations62
US8902401B2Dec 2, 2014
Optical imaging device with thermal attenuation
ZEISS CARL SMT GMBH1 citations61
US8363206B2Jan 29, 2013
Optical imaging device with thermal attenuation
ZEISS CARL SMT GMBH2 citations61
US7869147B2Jan 11, 2011
Holding device for optical element
ZEISS CARL SMT GMBH5 citations60
US10989897B2Apr 27, 2021
Optical element for the beam guidance of imaging light in projection lithography
ZEISS CARL SMT GMBH0 citations59
US11281114B2Mar 22, 2022
Projection exposure apparatus for semiconductor lithography
ZEISS CARL SMT GMBH0 citations58
US11169359B2Nov 9, 2021
Method for positioning a component of an optical system
ZEISS CARL SMT GMBH0 citations58
US12287587B2Apr 29, 2025
Damping arrangement for vibration damping of an element in an optical system
ZEISS CARL SMT GMBH0 citations56
US10890850B2Jan 12, 2021
Optical imaging arrangement with actively adjustable metrology support units
ZEISS CARL SMT GMBH0 citations52
US9766550B2Sep 19, 2017
Actuators and microlithography projection exposure systems and methods using the same
ZEISS CARL SMT GMBH0 citations52
US8659745B2Feb 25, 2014
Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations
ZEISS CARL SMT GMBH1 citations52
US10599051B2Mar 24, 2020
Projection exposure apparatus, and method for reducing deformations, resulting from dynamic accelerations, of components of the projection exposure apparatus
ZEISS CARL SMT GMBH0 citations51
US10684551B2Jun 16, 2020
EUV exposure apparatus with reflective elements having reduced influence of temperature variation
ZEISS CARL SMT GMBH0 citations50
US10317802B2Jun 11, 2019
EUV exposure apparatus with reflective elements having reduced influence of temperature variation
ZEISS CARL SMT GMBH0 citations50
US9810996B2Nov 7, 2017
Optical imaging device with thermal attenuation
ZEISS CARL SMT GMBH0 citations50
US9746778B2Aug 29, 2017
EUV exposure apparatus with reflective elements having reduced influence of temperature variation
ZEISS CARL SMT GMBH0 citations50
US9904175B2Feb 27, 2018
EUV imaging apparatus
ZEISS CARL SMT GMBH0 citations47
US11526089B2Dec 13, 2022
Compensation of creep effects in an imaging device
ZEISS CARL SMT GMBH0 citations44