Inventor

WALTER HOLGER

DE17 patents

⚠️ This page may combine multiple inventors who share the name “WALTER HOLGER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WALTER HOLGER

ZEISS CARL SMT GMBH

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

Projection exposure apparatus comprising a manipulator, and method for controlling a projection exposure apparatus

Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus

Method of operating a microlithographic projection exposure apparatus and projection objective of such an apparatus

Optical correction arrangement, projection objective having such an optical correction arrangement and microlithographic apparatus having such a projection objective

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

Projection exposure apparatus with optimized adjustment possibility

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

Projection exposure apparatus with optimized adjustment possibility

Microlithographic apparatus and method of varying a light irradiance distribution

BITTNER BORIS

Projection exposure apparatus with optimized adjustment possibility

Projection exposure apparatus with optimized adjustment possibility

WACKER CHEMIE GMBH

Catalytic hydrodehalogenation of halogen-containing compounds of group IV elements

ZEISS CARL SMT AG

Symmetrical objective having four lens groups for microlithography

EXLER MATTHIAS

Optical system of microlithographic projection exposure apparatus and method of correcting wavefront deformation in same