Inventor

KWAN YIM-BUN-PATRICK

DE69 patents

⚠️ This page may combine multiple inventors who share the name “KWAN YIM-BUN-PATRICK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KWAN YIM-BUN-PATRICK

ZEISS CARL SMT GMBH

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

Optical module for a microlithography objective holding optical elements with supporting devices located in a non-equidistant manner

Optical apparatus with adjustable action of force on an optical module

Optical imaging arrangement with a piezoelectric device

Method for controlling a motion of optical elements in lithography systems

Optical imaging arrangement with multiple metrology support units

Lens comprising a plurality of optical element disposed in a housing

Device consisting of at least one optical element

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

Optical assembly

Optical imaging arrangement with a piezoelectric device

Optical apparatus with adjustable action of force on an optical module

Optical module for a microlithography objective holding optical elements with supporting device located in non-equidistant manner

Optical imaging arrangement with multiple metrology support units

Lens comprising a plurality of optical element disposed in a housing

Optical imaging arrangement with individually actively supported components

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

ASML NETHERLANDS BV

Lithographic apparatus, device manufacturing method and device manufacturing thereby

Method for calibrating a lithographic projection apparatus and apparatus capable of applying such a method

Positioning device having two object holders

Calibrating a lithographic apparatus

Lithographic apparatus, device manufacturing method and device manufactured thereby

Lithographic apparatus and device manufacturing method

Lithographic apparatus, device manufacturing method and device manufactured thereby

ZEISS CARL SMT AG

Optical imaging arrangement

Device consisting of at least one optical element

Reflecting optical element with eccentric optical passageway

Optical assembly

Optical subassembly and projection objective in semiconductor lithography

Actuator device

Structure for use in a projection exposure system for manufacturing semiconductors

KWAN YIM-BUN PATRICK

Optical apparatus with adjustable action of force on an optical module

Lens comprising a plurality of optical element disposed in a housing

Calibration of a position measuring device of an optical device

Optical apparatus for use in photolithography

Optical element with low surface figure deformation

Optical imaging device with determination of imaging errors

XALTER STEFAN

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

ASML NETHERLAND BV

Lithographic apparatus, device manufacturing method, and device manufactured thereby

BLEIDISTEL SASCHA

Microlithographic projection exposure apparatus

ASM LITHOGRAPHY BV

Gas bearing and lithographic apparatus including such a bearing

KUGLER JENS

Optical module for a microlithography objective including holding and supporting devices

SCHOEPPACH ARMIN

Optical arrangement and microlithographic projection exposure apparatus including same

SINGER WOLFGANG

EUV lithography device and method for processing an optical element

BIEG HERMANN

Diaphragm changing device

VAN DER WIJST MARC WILHELMUS MARIA

Lithographic apparatus and device manufacturing method