Inventor
LALLY KEVIN
US8 patents
Patents
8 patentsUS7477960B2Jan 13, 2009
Fault detection and classification (FDC) using a run-to-run controller
TOKYO ELECTRON LTD86 citations95
US7324193B2Jan 29, 2008
Measuring a damaged structure formed on a wafer using optical metrology
TOKYO ELECTRON LTD30 citations92
US7801635B2Sep 21, 2010
Real-time parameter tuning for etch processes
TOKYO ELECTRON LTD13 citations83
US7642102B2Jan 5, 2010
Real-time parameter tuning using wafer thickness
TOKYO ELECTRON LTD15 citations83
US7619731B2Nov 17, 2009
Measuring a damaged structure formed on a wafer using optical metrology
TOKYO ELECTRON LTD11 citations83
US7623978B2Nov 24, 2009
Damage assessment of a wafer using optical metrology
TOKYO ELECTRON LTD7 citations73
US7576851B2Aug 18, 2009
Creating a library for measuring a damaged structure formed on a wafer using optical metrology
TOKYO ELECTRON LTD5 citations62
US7571074B2Aug 4, 2009
Method of using a wafer-thickness-dependant profile library
TOKYO ELECTRON LTD3 citations62