Inventor
MORIYA KATSUYUKI
JP16 patents
Patents
16 patentsUS7582545B2Sep 1, 2009
Forming method for film pattern, device, electro-optical apparatus, electronic apparatus, and manufacturing method for active matrix substrate
SEIKO EPSON CORP7 citations73
US7799407B2Sep 21, 2010
Bank structure, wiring pattern forming method, device, electro-optical device, and electronic apparatus
SEIKO EPSON CORP2 citations62
US7771246B2Aug 10, 2010
Method of forming film pattern, film pattern, device, electro optic device, and electronic apparatus
SEIKO EPSON CORP3 citations62
US7622385B2Nov 24, 2009
Wiring pattern forming method, film pattern forming method, semiconductor device, electro-optical device, and electronic equipment
SEIKO EPSON CORP2 citations62
US7556991B2Jul 7, 2009
Method for manufacturing thin film transistor, electro-optical device, and electronic apparatus
SEIKO EPSON CORP4 citations62
US7547567B2Jun 16, 2009
Method of forming film pattern, device, method of manufacturing device, electro-optical device, and electronic apparatus
SEIKO EPSON CORP5 citations62
US7371698B2May 13, 2008
Method of forming film pattern, active matrix substrate, electro-optic device, and electronic apparatus
SEIKO EPSON CORP6 citations62
US7335991B2Feb 26, 2008
Pattern forming structure, pattern forming method, device, electro-optical device, and electronic apparatus
SEIKO EPSON CORP4 citations62
US7294566B2Nov 13, 2007
Method for forming wiring pattern, method for manufacturing device, device, electro-optic apparatus, and electronic equipment
SEIKO EPSON CORP6 citations62
US9387669B2Jul 12, 2016
Test method
SEIKO EPSON CORP0 citations51
US7803515B2Sep 28, 2010
Film pattern forming method, device, electro-optical apparatus, and electronic appliance
SEIKO EPSON CORP1 citations51
US7767504B2Aug 3, 2010
Methods for forming film patterns by disposing a liquid within a plural-level partition structure
SEIKO EPSON CORP1 citations51
US7723133B2May 25, 2010
Method for forming pattern, and method for manufacturing liquid crystal display
SEIKO EPSON CORP1 citations51
US7691654B2Apr 6, 2010
Method for manufacturing active matrix substrate, active matrix substrate, electro-optical device and electronic apparatus
SEIKO EPSON CORP0 citations51
US7691562B2Apr 6, 2010
Method for forming film pattern, and method for manufacturing device, electro-optical device, electronic apparatus and active matrix substrate
SEIKO EPSON CORP0 citations41
US7429530B2Sep 30, 2008
Method of forming a pattern, method of forming wiring, semiconductor device, TFT device, electro-optic device, and electronic instrument
SEIKO EPSON CORP0 citations41