Inventor
SCHLESENER FRANK
DE31 patents
⚠️ This page may combine multiple inventors who share the name “SCHLESENER FRANK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
27 patentsUS9703206B2Jul 11, 2017
Method for operating an illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH4 citations83
US9280060B2Mar 8, 2016
Illumination system for microlithography
ZEISS CARL SMT GMBH5 citations82
US9983483B2May 29, 2018
Illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH2 citations73
US10444631B2Oct 15, 2019
Method of operating a microlithographic projection apparatus and illumination system of such an apparatus
ZEISS CARL SMT GMBH2 citations72
US9645503B2May 9, 2017
Collector
ZEISS CARL SMT GMBH5 citations72
US9632413B2Apr 25, 2017
Apparatus and method for compensating a defect of a channel of a microlithographic projection exposure system
ZEISS CARL SMT GMBH2 citations72
US9551941B2Jan 24, 2017
Illumination system for an EUV lithography device and facet mirror therefor
ZEISS CARL SMT GMBH4 citations72
US9703205B2Jul 11, 2017
Measuring an optical symmetry property on a projection exposure apparatus
ZEISS CARL SMT GMBH3 citations71
US9500954B2Nov 22, 2016
Illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH3 citations71
US9477157B2Oct 25, 2016
Illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH2 citations62
US9341957B2May 17, 2016
Method for operating an illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH2 citations62
US9217931B2Dec 22, 2015
Method for operating an illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH2 citations62
US9606441B2Mar 28, 2017
Illumination system for microlithography
ZEISS CARL SMT GMBH1 citations61
US10222704B2Mar 5, 2019
Method for operating an illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations51
US9665008B2May 30, 2017
Mirror system comprising at least one mirror for use for guiding illumination and imaging light in EUV projection lithography
ZEISS CARL SMT GMBH1 citations51
US9507269B2Nov 29, 2016
Illumination optical unit for projection lithography
ZEISS CARL SMT GMBH1 citations51
US9442385B2Sep 13, 2016
Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
ZEISS CARL SMT GMBH0 citations51
US9411245B2Aug 9, 2016
Polarization-influencing optical arrangement, in particular in a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations51
US10088754B2Oct 2, 2018
Illumination system for microlithography
ZEISS CARL SMT GMBH0 citations50
US9910359B2Mar 6, 2018
Illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations50
US9310690B2Apr 12, 2016
Illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations50
US9817317B2Nov 14, 2017
Optical system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations41
US9581910B2Feb 28, 2017
Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations41
US9500956B2Nov 22, 2016
Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure
ZEISS CARL SMT GMBH0 citations41
US9488918B2Nov 8, 2016
Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
ZEISS CARL SMT GMBH0 citations41
US9182677B2Nov 10, 2015
Optical system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations41
US9753375B2Sep 5, 2017
Illumination optical unit for projection lithography
ZEISS CARL SMT GMBH0 citations40