Inventor

NITTALA KRISHNA

US21 patents

⚠️ This page may combine multiple inventors who share the name “NITTALA KRISHNA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NITTALA KRISHNA

APPLIED MATERIALS INC

Enhanced lift pin design to eliminate local thickness non-uniformity in teos oxide films

Methods, systems, and apparatus for processing substrates using one or more amorphous carbon hardmask layers

Methods to reduce material surface roughness

Method of using dual frequency RF power in a process chamber

Boron concentration tunability in boron-silicon films

Boron concentration tunability in boron-silicon films

Methods to reduce material surface roughness

Enhanced lift pin design to eliminate local thickness non-uniformity in teos oxide films

Film formation via pulsed RF plasma

Methods, systems, and apparatus for processing substrates using one or more amorphous carbon hardmask layers

Polysilicon liners

Controlling concentration profiles for deposited films using machine learning

Ion implantation for reduced hydrogen incorporation in amorphous silicon

Method of using dual frequency RF power in a process chamber

Integration processes utilizing boron-doped silicon materials

Hydrogen management in plasma deposited films

Hardmasks and processes for forming hardmasks by plasma-enhanced chemical vapor deposition

Doping semiconductor films

Controlling concentration profiles for deposited films using machine learning

Amorphous silicon-based films resistant to crystallization

LAM RES CORP

Low-K oxide deposition by hydrolysis and condensation