P

Inventor

CHANG ELLIS

US26 patents
⚠️ This page may combine multiple inventors who share the name “CHANG ELLIS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KLA TENCOR CORP

10 patents
US7904845B2Mar 8, 2011

Determining locations on a wafer to be reviewed during defect review

KLA TENCOR CORP50 citations92
US9170209B1Oct 27, 2015

Inspection guided overlay metrology

KLA TENCOR CORP11 citations84
US10387608B2Aug 20, 2019

Metrology target identification, design and verification

KLA TENCOR CORP6 citations81
US9910953B2Mar 6, 2018

Metrology target identification, design and verification

KLA TENCOR CORP7 citations81
US8948495B2Feb 3, 2015

Inspecting a wafer and/or predicting one or more characteristics of a device being formed on a wafer

KLA TENCOR CORP8 citations81
US9576861B2Feb 21, 2017

Method and system for universal target based inspection and metrology

KLA TENCOR CORP2 citations72
US8826200B2Sep 2, 2014

Alteration for wafer inspection

KLA TENCOR CORP2 citations63
US11295438B2Apr 5, 2022

Method and system for mixed mode wafer inspection

KLA TENCOR CORP0 citations61
US9518932B2Dec 13, 2016

Metrology optimized inspection

KLA TENCOR CORP2 citations61
US10192303B2Jan 29, 2019

Method and system for mixed mode wafer inspection

KLA TENCOR CORP0 citations51

KLA TENCOR TECH CORP

3 patents
US7570796B2Aug 4, 2009

Methods and systems for utilizing design data in combination with inspection data

KLA TENCOR TECH CORP286 citations98
US7711514B2May 4, 2010

Computer-implemented methods, carrier media, and systems for generating a metrology sampling plan

KLA TENCOR TECH CORP19 citations92
US7571422B2Aug 4, 2009

Method for generating a design rule map having spatially varying overlay budget

KLA TENCOR TECH CORP36 citations92

CHANG ELLIS

2 patents
US8559001B2Oct 15, 2013

Inspection guided overlay metrology

CHANG ELLIS35 citations92
US9087367B2Jul 21, 2015

Determining design coordinates for wafer defects

CHANG ELLIS11 citations82

PARK ALLEN

2 patents
US8194968B2Jun 5, 2012

Methods and systems for using electrical information for a device being fabricated on a wafer to perform one or more defect-related functions

PARK ALLEN33 citations91
US8594823B2Nov 26, 2013

Scanner performance comparison and matching using design and defect data

PARK ALLEN9 citations78

KLA TENCOR TECH CORPORATION

2 patents
US10713771B2Jul 14, 2020

Methods and systems for inspection of wafers and reticles using designer intent data

KLA TENCOR TECH CORPORATION1 citations68
US11348222B2May 31, 2022

Methods and systems for inspection of wafers and reticles using designer intent data

KLA TENCOR TECH CORPORATION0 citations58

KLA-TENCOR TECH CORP

1 patent
US9401014B2Jul 26, 2016

Methods and systems for utilizing design data in combination with inspection data

KLA-TENCOR TECH CORP22 citations92

ZAFAR KHURRAM

1 patent
US8923600B2Dec 30, 2014

Methods and systems for utilizing design data in combination with inspection data

ZAFAR KHURRAM33 citations90

VOLK WILLIAM

1 patent
US9002497B2Apr 7, 2015

Methods and systems for inspection of wafers and reticles using designer intent data

VOLK WILLIAM14 citations86

ADEL MICHAEL

1 patent
US9151712B1Oct 6, 2015

Rule checking for metrology and inspection

ADEL MICHAEL16 citations84

CHEN CHIEN-HUEI ADAM

1 patent
US8139844B2Mar 20, 2012

Methods and systems for determining a defect criticality index for defects on wafers

CHEN CHIEN-HUEI ADAM11 citations82

CHOI SUNYONG

1 patent
US9659670B2May 23, 2017

Computer-implemented methods, computer-readable media, and systems for classifying defects detected in a memory device area on a wafer

CHOI SUNYONG20 citations80

GAO LISHENG

1 patent
US8989479B2Mar 24, 2015

Region based virtual fourier filter

GAO LISHENG3 citations54