Inventor
CHAPPLE-SOKOL JONATHAN DANIEL
US4 patents
Patents
4 patentsUS5665608ASep 9, 1997
Method of aluminum oxide low pressure chemical vapor deposition (LPCVD) system-fourier transform infrared (FTIR) source chemical control
IBM478 citations97
US6498096B2Dec 24, 2002
Borderless contact to diffusion with respect to gate conductor and methods for fabricating
IBM62 citations94
US5648113AJul 15, 1997
Aluminum oxide LPCVD system
IBM25 citations90
US6215190B1Apr 10, 2001
Borderless contact to diffusion with respect to gate conductor and methods for fabricating
IBM18 citations89