Inventor
GRANT ROBERT W
US27 patents
⚠️ This page may combine multiple inventors who share the name “GRANT ROBERT W”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NANOSCALE COMPONENTS INC
6 patentsUS9598789B2Mar 21, 2017
Method for alkaliating anodes
NANOSCALE COMPONENTS INC12 citations82
US10128491B2Nov 13, 2018
Method for alkaliating electrodes
NANOSCALE COMPONENTS INC3 citations71
US9748599B2Aug 29, 2017
Phased introduction of lithium into the pre-lithiated anode of a lithium ion electrochemical cell
NANOSCALE COMPONENTS INC4 citations65
US11916217B2Feb 27, 2024
Methods for alkaliating roll anodes
NANOSCALE COMPONENTS INC0 citations60
US11005088B2May 11, 2021
Methods for alkaliating roll anodes
NANOSCALE COMPONENTS INC0 citations60
US10128487B2Nov 13, 2018
Methods for alkaliating roll anodes
NANOSCALE COMPONENTS INC0 citations50
SUBMICRON SYSTEMS INC
4 patentsUS5247954ASep 28, 1993
Megasonic cleaning system
SUBMICRON SYSTEMS INC95 citations95
US5234540AAug 10, 1993
Process for etching oxide films in a sealed photochemical reactor
SUBMICRON SYSTEMS INC105 citations95
US5228206AJul 20, 1993
Cluster tool dry cleaning system
SUBMICRON SYSTEMS INC112 citations95
US5437710AAug 1, 1995
Chemical processing system for maintaining concentration of semiconductor processing solution
SUBMICRON SYSTEMS INC9 citations73
PRIMAXX INC
4 patentsUS6428847B1Aug 6, 2002
Vortex based CVD reactor
PRIMAXX INC44 citations89
US6261373B1Jul 17, 2001
Method and apparatus for metal oxide chemical vapor deposition on a substrate surface
PRIMAXX INC13 citations73
US6231933B1May 15, 2001
Method and apparatus for metal oxide chemical vapor deposition on a substrate surface
PRIMAXX INC8 citations73
US6391804B1May 21, 2002
Method and apparatus for uniform direct radiant heating in a rapid thermal processing reactor
PRIMAXX INC11 citations66
FSI CORP
3 patentsFSI INT INC
3 patentsPENN STATE RES FOUND
2 patentsSYMETRIX CORP
2 patentsUS6258733B1Jul 10, 2001
Method and apparatus for misted liquid source deposition of thin film with reduced mist particle size
SYMETRIX CORP60 citations96
US6116184ASep 12, 2000
Method and apparatus for misted liquid source deposition of thin film with reduced mist particle size
SYMETRIX CORP27 citations93