P

Inventor

KEIJ STEFAN CAROLUS JACOBUS ANTONIUS

NL12 patents
⚠️ This page may combine multiple inventors who share the name “KEIJ STEFAN CAROLUS JACOBUS ANTONIUS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ASML NETHERLANDS BV

9 patents
US7564555B2Jul 21, 2009

Method and apparatus for angular-resolved spectroscopic lithography characterization

ASML NETHERLANDS BV21 citations92
US7898662B2Mar 1, 2011

Method and apparatus for angular-resolved spectroscopic lithography characterization

ASML NETHERLANDS BV13 citations84
US7440079B2Oct 21, 2008

Lithographic apparatus, alignment system, and device manufacturing method

ASML NETHERLANDS BV10 citations81
US12032299B2Jul 9, 2024

Metrology method and associated metrology and lithographic apparatuses

ASML NETHERLANDS BV2 citations71
US11105619B2Aug 31, 2021

Measurement apparatus

ASML NETHERLANDS BV3 citations70
US7692792B2Apr 6, 2010

Method and apparatus for angular-resolved spectroscopic lithography characterization

ASML NETHERLANDS BV6 citations62
US11874103B2Jan 16, 2024

Measurement apparatus

ASML NETHERLANDS BV0 citations60
US10705438B2Jul 7, 2020

Lithographic method

ASML NETHERLANDS BV0 citations48
US10571814B2Feb 25, 2020

Lithographic method

ASML NETHERLANDS BV0 citations48

BHATTACHARYYA KAUSTUVE

1 patent
US9223227B2Dec 29, 2015

Inspection apparatus and method, lithographic apparatus, lithographic processing cell and device manufacturing method

BHATTACHARYYA KAUSTUVE16 citations80

VAN DER SCHAAR MAURITS

1 patent
US8064056B2Nov 22, 2011

Substrate used in a method and apparatus for angular-resolved spectroscopic lithography characterization

VAN DER SCHAAR MAURITS6 citations73

DEN BOEF ARIE JEFFREY

1 patent
US8264686B2Sep 11, 2012

Lithographic apparatus and device manufacturing method using overlay measurement

DEN BOEF ARIE JEFFREY2 citations62