Inventor
NAKASHIMA TSUNENAGA
JP23 patents
⚠️ This page may combine multiple inventors who share the name “NAKASHIMA TSUNENAGA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
19 patentsUS7287920B2Oct 30, 2007
Semiconductor manufacturing apparatus and method
TOKYO ELECTRON LTD15 citations84
US9984904B2May 29, 2018
Substrate treatment system, substrate transfer method and computer storage medium
TOKYO ELECTRON LTD5 citations83
US9460942B2Oct 4, 2016
Substrate treatment system, substrate transfer method and computer storage medium
TOKYO ELECTRON LTD7 citations83
US7640885B2Jan 5, 2010
Liquid processing method and liquid processing apparatus
TOKYO ELECTRON LTD8 citations83
US7752999B2Jul 13, 2010
Wet processing system, wet processing method and storage medium
TOKYO ELECTRON LTD10 citations80
US9984905B2May 29, 2018
Substrate treatment system, substrate transfer method and computer storage medium
TOKYO ELECTRON LTD3 citations72
US9287145B2Mar 15, 2016
Substrate treatment system, substrate transfer method, and a non-transitory computer storage medium
TOKYO ELECTRON LTD7 citations72
US10643872B2May 5, 2020
Liquid processing apparatus, liquid processing method, and storage medium
TOKYO ELECTRON LTD5 citations71
US12131919B2Oct 29, 2024
Substrate cleaning apparatus and substrate cleaning method
TOKYO ELECTRON LTD0 citations62
US10807027B2Oct 20, 2020
Treatment solution supply apparatus and substrate treatment system
TOKYO ELECTRON LTD1 citations61
US7547614B2Jun 16, 2009
Solution treatment apparatus and solution treatment method
TOKYO ELECTRON LTD4 citations60
US11865590B2Jan 9, 2024
Substrate cleaning method, processing container cleaning method, and substrate processing device
TOKYO ELECTRON LTD0 citations58
US11504751B2Nov 22, 2022
Substrate cleaning method, processing container cleaning method, and substrate processing device
TOKYO ELECTRON LTD0 citations58
US12398461B2Aug 26, 2025
Substrate cleaning apparatus and substrate cleaning method
TOKYO ELECTRON LTD0 citations52
US11630392B2Apr 18, 2023
Substrate processing apparatus
TOKYO ELECTRON LTD0 citations51
US8354141B2Jan 15, 2013
Liquid treatment apparatus, mounting and dismounting method of a cup body, and storage medium
TOKYO ELECTRON LTD0 citations49
US7984690B2Jul 26, 2011
Liquid treatment apparatus, mounting and dismounting method of a cup body, and storage medium
TOKYO ELECTRON LTD0 citations49
US7736498B2Jun 15, 2010
Solution treatment apparatus and solution treatment method
TOKYO ELECTRON LTD0 citations49
US12557591B2Feb 17, 2026
Linearly moving mechanism and method of suppressing particle scattering
TOKYO ELECTRON LTD0 citations47
NAKASHIMA TSUNENAGA
3 patentsUS8469285B2Jun 25, 2013
Chemical liquid supply nozzle and chemical liquid supply method
NAKASHIMA TSUNENAGA7 citations82
US8236378B2Aug 7, 2012
Wet processing system, wet processing method and storage medium
NAKASHIMA TSUNENAGA2 citations57
US8511331B2Aug 20, 2013
Process liquid feed mechanism
NAKASHIMA TSUNENAGA3 citations50