Inventor

JI XIAOSONG

US2 patents

Patents

2 patents

US9064812B2Jun 23, 2015

Aspect ratio dependent etch (ARDE) lag reduction process by selective oxidation with inert gas sputtering

APPLIED MATERIALS INC6 citations68

US9627216B2Apr 18, 2017

Method for forming features in a silicon containing layer

APPLIED MATERIALS INC0 citations37