Inventor
CHEN XIAOLIN
CN32 patents
⚠️ This page may combine multiple inventors who share the name “CHEN XIAOLIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
10 patentsUS7902080B2Mar 8, 2011
Deposition-plasma cure cycle process to enhance film quality of silicon dioxide
APPLIED MATERIALS INC55 citations98
US7081414B2Jul 25, 2006
Deposition-selective etch-deposition process for dielectric film gapfill
APPLIED MATERIALS INC98 citations98
US7109114B2Sep 19, 2006
HDP-CVD seasoning process for high power HDP-CVD gapfil to improve particle performance
APPLIED MATERIALS INC515 citations95
US7465680B2Dec 16, 2008
Post deposition plasma treatment to increase tensile stress of HDP-CVD SIO2
APPLIED MATERIALS INC28 citations92
US11062921B1Jul 13, 2021
Systems and methods for aluminum-containing film removal
APPLIED MATERIALS INC11 citations84
US8889566B2Nov 18, 2014
Low cost flowable dielectric films
APPLIED MATERIALS INC9 citations83
US7799698B2Sep 21, 2010
Deposition-selective etch-deposition process for dielectric film gapfill
APPLIED MATERIALS INC4 citations63
US7691753B2Apr 6, 2010
Deposition-selective etch-deposition process for dielectric film gapfill
APPLIED MATERIALS INC3 citations63
US7745351B2Jun 29, 2010
Post deposition plasma treatment to increase tensile stress of HDP-CVD SIO2
APPLIED MATERIALS INC4 citations62
US11728177B2Aug 15, 2023
Systems and methods for nitride-containing film removal
APPLIED MATERIALS INC0 citations48
FINISAR CORP
4 patentsUS8786938B2Jul 22, 2014
DP-QPSK demodulator
FINISAR CORP2 citations62
US10007063B2Jun 26, 2018
Wavelength division multiplexer array
FINISAR CORP0 citations51
US9575255B2Feb 21, 2017
Wavelength division multiplexer array
FINISAR CORP1 citations51
US8792155B2Jul 29, 2014
Athermal DQPSK and/or DPSK demodulator
FINISAR CORP0 citations41
LIANG JINGMEI
3 patentsUS8563445B2Oct 22, 2013
Conformal layers by radical-component CVD
LIANG JINGMEI49 citations94
US8629067B2Jan 14, 2014
Dielectric film growth with radicals produced using flexible nitrogen/hydrogen ratio
LIANG JINGMEI11 citations84
US9404178B2Aug 2, 2016
Surface treatment and deposition for reduced outgassing
LIANG JINGMEI4 citations73