Inventor

YOON KWANG-SUB

KR23 patents

⚠️ This page may combine multiple inventors who share the name “YOON KWANG-SUB”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

YOON KWANG-SUB

SAMSUNG ELECTRONICS CO LTD

Photosenseitive polymer having fluorinated ethylene glycol group and chemically amplified resist composition comprising the same

Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same

Resist composition comprising photosensitive polymer having loctone in its backbone

Photosensitive monomer, photosensitive polymer and chemically amplified resist composition comprising lactone group having acid-labile protecting group

Photosensitive polymer

Method for fabricating semiconductor device

Substrate target for in-situ lithography metrology, metrology method for in-situ lithography, and method of manufacturing integrated circuit device by using in-situ metrology

Photosensitive polymer including fluorine and resist composition containing the same

Method of manufacturing a capacitor and method of manufacturing a dynamic random access memory device using the same

Thinner composition and method of removing photoresist using the same

Photosensitive polymer including fluorine, resist composition containing the same and patterning method using the resist composition

Photosensitive polymer and resist composition containing the same

Method of forming pattern of semiconductor device

Methods of forming layer patterns of a semiconductor device

Semiconductor device and method for fabricating the same

Method of manufacturing a semiconductor device

Resist composition comprising photosensitive polymer having lactone in its backbone

Resist composition comprising photosensitive polymer having lactone in its backbone

Thinner composition and method of removing photoresist using the same

Optical element holder and projection exposure apparatus having the same

Methods of manufacturing semiconductor devices and electronic devices

KIM JI-MYUNG

Photomask including focus metrology mark, substrate target including focus monitor pattern, metrology method for lithography process, and method of manufacturing integrated circuit device

YOON DONG-KI

Method of forming patterns of semiconductor device