Inventor
TEJNIL EDITA
US17 patents
⚠️ This page may combine multiple inventors who share the name “TEJNIL EDITA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INTEL CORP
11 patentsUS6632576B2Oct 14, 2003
Optical assist feature for two-mask exposure lithography
INTEL CORP19 citations92
US6506526B2Jan 14, 2003
Method and apparatus for a reflective mask that is inspected at a first wavelength and exposed during semiconductor manufacturing at a second wavelength
INTEL CORP23 citations91
US6410193B1Jun 25, 2002
Method and apparatus for a reflective mask that is inspected at a first wavelength and exposed during semiconductor manufacturing at a second wavelength
INTEL CORP36 citations91
US6625800B1Sep 23, 2003
Method and apparatus for physical image based inspection system
INTEL CORP15 citations83
US6972419B2Dec 6, 2005
Extreme ultraviolet radiation imaging
INTEL CORP9 citations73
US6774990B2Aug 10, 2004
Method to inspect patterns with high resolution photoemission
INTEL CORP7 citations71
US7732106B2Jun 8, 2010
Methods for etching devices used in lithography
INTEL CORP2 citations62
US7326501B2Feb 5, 2008
Method for correcting focus-dependent line shifts in printing with sidewall chrome alternating aperture masks (SCAAM)
INTEL CORP4 citations62
US7033708B2Apr 25, 2006
Image focus monitor for alternating phase shift masks
INTEL CORP5 citations62
US6800406B2Oct 5, 2004
Method of generating optical assist features for two-mask exposure lithography
INTEL CORP3 citations62
US7438997B2Oct 21, 2008
Imaging and devices in lithography
INTEL CORP0 citations51
TEJNIL EDITA
2 patentsUS8792147B2Jul 29, 2014
Method, program product and apparatus for creating optimal test patterns for optical model calibration and for selecting suitable calibration test patterns from an arbitrary layout
TEJNIL EDITA3 citations59
US8521481B2Aug 27, 2013
Method, program product and apparatus for modeling resist development of a lithography process
TEJNIL EDITA3 citations59