Inventor

FUKUHARA KAZUYA

JP66 patents

⚠️ This page may combine multiple inventors who share the name “FUKUHARA KAZUYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FUKUHARA KAZUYA

TOSHIBA KK

Method for designing an illumination light source, method for designing a mask pattern, method for manufacturing a photomask, method for manufacturing a semiconductor device and a computer program product

Method of determining photo mask, method of manufacturing semiconductor device, and computer program product

Mask data correction method, photomask manufacturing method, computer program, optical image prediction method, resist pattern shape prediction method, and semiconductor device manufacturing method

Inspection method, processor and method for manufacturing a semiconductor device

Exposure method, exposure tool and method of manufacturing a semiconductor device

Exposure system, exposure method and method for manufacturing a semiconductor device

Method for evaluating a local flare, correction method for a mask pattern, manufacturing method for a semiconductor device and a computer program product

Method of forming contact hole and method of manufacturing semiconductor device

Mask for inspecting an exposure apparatus, a method of inspecting an exposure apparatus, and an exposure apparatus

Photomask manufacturing method and semiconductor device manufacturing method

Photomask manufacturing method and semiconductor device manufacturing method

Exposure condition setting method, semiconductor device manufacturing method, and exposure condition setting program

Photomask and method of manufacturing semiconductor device using the photomask

System, method and program for generating mask data, exposure mask and semiconductor device in consideration of optical proximity effects

Exposure system, test mask for flare testing, method for evaluating lithography process, method for evaluating exposure tools, method for generating corrected mask pattern, and method for manufacturing semiconductor device

Exposure apparatus, exposure method, and semiconductor device manufacturing method

Method for testing a polarization state, method for manufacturing a semiconductor device, and test substrate for testing a polarization state

Exposure apparatus inspection method and exposure apparatus

Inspection method and a photomask

Photomask designing method, pattern predicting method and computer program product

Managing method of exposure apparatus, managing method of mask, exposure method, and manufacturing method of semiconductor device

Exposure method and method for manufacturing semiconductor device

Exposure system, test mask for monitoring polarization, and method for monitoring polarization

Exposure apparatus inspection mask and exposure apparatus inspection method

Photomask unit, exposing method and method for manufacturing semiconductor device

Method for selecting photomask substrate, method for manufacturing photomask, and method for manufacturing semiconductor device

Immersion exposure method and immersion exposure apparatus which transfer image of pattern formed on mask onto substrate through immersion medium

Inspection method and photomask

Method of manufacturing semiconductor device

KIOXIA CORP

Imprint device, imprint method and method of manufacturing semiconductor device

Template, method for manufacturing template, and method for manufacturing semiconductor device

Imprint apparatus and imprint method

Imprint apparatus, imprint method, and method of manufacturing semiconductor device

Template, patterning method, and method for manufacturing semiconductor device

Template, template manufacturing method, and semiconductor device manufacturing method

Imprinting method and imprinting apparatus

FUKUHARA KAZUYA

Photomask and pattern forming method

Mask pattern correcting method

Pattern monitor mark and monitoring method suitable for micropattern

Pattern forming method, pattern forming apparatus, and method for manufacturing semiconductor device

Semiconductor device manufacturing method

KASHIWAGI HIROYUKI

Pattern forming method

Method for inspecting nano-imprint template

RENESAS ELECTRONICS CORP

Semiconductor device and production method thereof

TOKYO SHIBAURA ELECTRIC CO

Aberration measuring method of projection optical system

TOSHIBA MEMORY CORP

Imprint apparatus, imprint method, and method of manufacturing semiconductor device

ITOH MASAMITSU

Photomask manufacturing method and semiconductor device manufacturing method

RENESAS TECH CORP

Power MOSFET, power MOSFET packaged device, and method of manufacturing power MOSFET

MISUMI KAZUYUKI

Semiconductor device including power supply bar having jutted portion, parallel running portion and bent portion and manufacturing method therefor

KASA KENTARO

Exposure apparatus inspection method and method for manufacturing semiconductor device