Inventor
NAKASUGI TETSURO
JP50 patents
⚠️ This page may combine multiple inventors who share the name “NAKASUGI TETSURO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
33 patentsUS6897454B2May 24, 2005
Energy beam exposure method and exposure apparatus
TOSHIBA KK146 citations98
US5989759ANov 23, 1999
Pattern forming method using alignment from latent image or base pattern on substrate
TOSHIBA KK41 citations96
US6147355ANov 14, 2000
Pattern forming method
TOSHIBA KK22 citations93
US6803589B2Oct 12, 2004
Apparatus and method applied to exposure by charged beam
TOSHIBA KK23 citations92
US6703629B2Mar 9, 2004
Charged beam exposure apparatus having blanking aperture and basic figure aperture
TOSHIBA KK18 citations92
US6507034B1Jan 14, 2003
Charge beam exposure apparatus, charge beam exposure method, and charge beam exposure mask
TOSHIBA KK23 citations92
US6140654AOct 31, 2000
Charged beam lithography apparatus and method thereof
TOSHIBA KK18 citations92
US5994030ANov 30, 1999
Pattern-forming method and lithographic system
TOSHIBA KK23 citations92
US5933211AAug 3, 1999
Charged beam lithography apparatus and method thereof
TOSHIBA KK39 citations92
US9381540B2Jul 5, 2016
Pattern forming method
TOSHIBA KK6 citations84
US7435978B2Oct 14, 2008
System, method and a program for correcting conditions for controlling a charged particle beam for lithography and observation, and a program and method for manufacturing a semiconductor device
TOSHIBA KK10 citations84
US7202488B2Apr 10, 2007
Correction system, method of correcting deflection distortion, program and method for manufacturing a semiconductor device
TOSHIBA KK18 citations84
US6737658B1May 18, 2004
Pattern observation apparatus and pattern observation method
TOSHIBA KK17 citations84
US6512237B2Jan 28, 2003
Charged beam exposure method and charged beam exposure apparatus
TOSHIBA KK13 citations84
US7011915B2Mar 14, 2006
Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same
TOSHIBA KK6 citations74
US6941008B2Sep 6, 2005
Pattern forming method
TOSHIBA KK7 citations74
US6818364B2Nov 16, 2004
Charged particle beam exposure apparatus and exposure method
TOSHIBA KK6 citations74
US6762421B2Jul 13, 2004
Charged particle beam exposure apparatus and exposure method
TOSHIBA KK6 citations74
US6376136B1Apr 23, 2002
Charged beam exposure method
TOSHIBA KK9 citations74
US7242014B2Jul 10, 2007
Charged particle beam drawing equipment, method of adjusting aperture mask, and method of manufacturing semiconductor device
TOSHIBA KK9 citations73
US6093931AJul 25, 2000
Pattern-forming method and lithographic system
TOSHIBA KK11 citations73
US7648809B2Jan 19, 2010
Electron beam exposure method, hot spot detecting apparatus, semiconductor device manufacturing method, and computer program product
TOSHIBA KK2 citations63
US7368737B2May 6, 2008
Electron beam writing method, electron beam writing apparatus and semiconductor device manufacturing method
TOSHIBA KK2 citations63
US7283885B2Oct 16, 2007
Electron beam lithography system, method of electron beam lithography, program and method for manufacturing a semiconductor device with direct writing
TOSHIBA KK2 citations63
US7264909B2Sep 4, 2007
Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same
TOSHIBA KK4 citations63
US7045801B2May 16, 2006
Charged beam exposure apparatus having blanking aperture and basic figure aperture
TOSHIBA KK3 citations63
US6914252B2Jul 5, 2005
Charged beam exposure apparatus having blanking aperture and basic figure aperture
TOSHIBA KK2 citations63
US9360752B2Jun 7, 2016
Pattern formation method
TOSHIBA KK0 citations52
US8992789B2Mar 31, 2015
Method for manufacturing mold
TOSHIBA KK1 citations52
US7482604B2Jan 27, 2009
Electron beam lithography apparatus, lithography method, lithography program, and manufacturing method of a semiconductor device
TOSHIBA KK0 citations52
US7985958B2Jul 26, 2011
Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing program
TOSHIBA KK1 citations51
US7889910B2Feb 15, 2011
Character pattern extracting method, charged particle beam drawing method, and character pattern extracting program
TOSHIBA KK0 citations41
US7459705B2Dec 2, 2008
Charged particle beam exposure method of character projection system, charged particle beam exposure device of character projection system, program for use in charged particle beam exposure device, and manufacturing method of semiconductor device
TOSHIBA KK0 citations41
YONEDA IKUO
3 patentsTOSHIBA MEMORY CORP
3 patentsUS11004683B2May 11, 2021
Imprint apparatus, imprint method, and method of manufacturing semiconductor device
TOSHIBA MEMORY CORP2 citations73
US9885118B2Feb 6, 2018
Template forming method, template, and template base material
TOSHIBA MEMORY CORP2 citations71
US10796948B2Oct 6, 2020
Pattern forming method and imprint apparatus
TOSHIBA MEMORY CORP1 citations61
KIOXIA CORP
3 patentsUS12078925B2Sep 3, 2024
Imprint apparatus and imprint method
KIOXIA CORP1 citations62
US11837469B2Dec 5, 2023
Imprint apparatus, imprint method, and method of manufacturing semiconductor device
KIOXIA CORP0 citations62
US11953825B2Apr 9, 2024
Imprint apparatus, imprint method, and manufacturing method of semiconductor device
KIOXIA CORP0 citations52
HATANO MASAYUKI
3 patentsUS8973494B2Mar 10, 2015
Imprint method and imprint apparatus
HATANO MASAYUKI2 citations61
US8180472B2May 15, 2012
Control method for semiconductor manufacturing apparatus, control system for semiconductor manufacturing apparatus, and manufacturing method for semiconductor device
HATANO MASAYUKI0 citations51
US8118585B2Feb 21, 2012
Pattern formation method and a method for manufacturing a semiconductor device
HATANO MASAYUKI0 citations40