Inventor
NEEFS PATRICIUS JACOBUS
NL5 patents
Patents
5 patentsUS11774869B2Oct 3, 2023
Method and system for determining overlay
ASML NETHERLANDS BV0 citations59
USRE49142EJul 19, 2022
Lithographic apparatus and an object positioning system
ASML NETHERLANDS BV0 citations59
US10508896B2Dec 17, 2019
Measurement substrate and a measurement method
ASML NETHERLANDS BV1 citations59
US9939738B2Apr 10, 2018
Lithographic apparatus and an object positioning system
ASML NETHERLANDS BV0 citations48
US10534271B2Jan 14, 2020
Lithography apparatus and a method of manufacturing a device
ASML NETHERLANDS BV0 citations34