Inventor

NIJMEIJER GERRIT JOHANNES

US19 patents

⚠️ This page may combine multiple inventors who share the name “NIJMEIJER GERRIT JOHANNES”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NIJMEIJER GERRIT JOHANNES

ASML NETHERLANDS BV

Substrate placement in immersion lithography

Off-axis levelling in lithographic projection apparatus

Lithographic projection apparatus using catoptrics in an optical sensor system, optical arrangement, method of measuring, and device manufacturing method

Off-axis levelling in lithographic projection apparatus

Off-axis leveling in lithographic projection apparatus

Substrate placement in immersion lithography

Lithographic apparatus, method of calibration, calibration plate, device manufacturing method, and device manufactured thereby

Mark position measuring apparatus and method, lithographic apparatus and device manufacturing method

Substrate placement in immersion lithography

Lithographic apparatus, device manufacturing method, and device manufactured thereby

Lithographic apparatus, method of exposing a substrate, method of measurement, device manufacturing method, and device manufactured thereby

Substrate placement in immersion lithography

System and method of measurement, system and method of alignment, lithographic apparatus and method

Position measuring apparatus, position measuring method, lithographic apparatus and device manufacturing method

ASML HOLDING NV

Wafer alignment using form birefringence of targets or product

Alignment mark for two-dimensional alignment in an alignment system

Apparatus with a sensor and a method of performing target measurement

HOOGENDAM CHRISTIAAN ALEXANDER

Substrate placement in immersion lithography

Substrate placement in immersion lithography