Inventor
KITSUNAI HIROYUKI
JP31 patents
⚠️ This page may combine multiple inventors who share the name “KITSUNAI HIROYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
18 patentsUS6590179B2Jul 8, 2003
Plasma processing apparatus and method
HITACHI LTD66 citations96
US5258047ANov 2, 1993
Holder device and semiconductor producing apparatus having same
HITACHI LTD73 citations96
US6616759B2Sep 9, 2003
Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor
HITACHI LTD58 citations95
US7376479B2May 20, 2008
Process monitoring device for sample processing apparatus and control method of sample processing apparatus
HITACHI LTD15 citations93
US7158848B2Jan 2, 2007
Process monitoring device for sample processing apparatus and control method of sample processing apparatus
HITACHI LTD19 citations93
US7058467B2Jun 6, 2006
Process monitoring device for sample processing apparatus and control method of sample processing apparatus
HITACHI LTD16 citations93
US7058470B2Jun 6, 2006
Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor
HITACHI LTD11 citations93
US6879867B2Apr 12, 2005
Process monitoring device for sample processing apparatus and control method of sample processing apparatus
HITACHI LTD25 citations93
US6706543B2Mar 16, 2004
Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a therefor
HITACHI LTD13 citations93
US6733618B2May 11, 2004
Disturbance-free, recipe-controlled plasma processing system and method
HITACHI LTD18 citations92
US6186153B1Feb 13, 2001
Plasma treatment method and manufacturing method of semiconductor device
HITACHI LTD25 citations91
US7601240B2Oct 13, 2009
Disturbance-free, recipe-controlled plasma processing system and method
HITACHI LTD9 citations84
US6881352B2Apr 19, 2005
Disturbance-free, recipe-controlled plasma processing method
HITACHI LTD12 citations84
US7343217B2Mar 11, 2008
System for monitoring and controlling a semiconductor manufacturing apparatus using prediction model equation
HITACHI LTD4 citations74
US6828165B2Dec 7, 2004
Semiconductor plasma processing apparatus with first and second processing state monitoring units
HITACHI LTD10 citations74
US6747239B2Jun 8, 2004
Plasma processing apparatus and method
HITACHI LTD8 citations74
US4708350ANov 24, 1987
Magnetic liquid seal with magnetized deformable magnet
HITACHI LTD14 citations73
US6743733B2Jun 1, 2004
Process for producing a semiconductor device including etching using a multi-step etching treatment having different gas compositions in each step
HITACHI LTD4 citations63
HITACHI HIGH TECH CORP
7 patentsUS6939435B1Sep 6, 2005
Plasma processing apparatus and processing method
HITACHI HIGH TECH CORP7 citations74
US7567422B2Jul 28, 2009
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP6 citations63
US7122096B2Oct 17, 2006
Method and apparatus for processing semiconductor
HITACHI HIGH TECH CORP2 citations63
US7473332B2Jan 6, 2009
Method for processing semiconductor
HITACHI HIGH TECH CORP0 citations52
US7147747B2Dec 12, 2006
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP1 citations52
US7147748B2Dec 12, 2006
Plasma processing method
HITACHI HIGH TECH CORP1 citations52
US10153128B2Dec 11, 2018
Charged particle beam apparatus and sample elevating apparatus
HITACHI HIGH TECH CORP0 citations39