Inventor
OHSAKI HIROMI
JP16 patents
⚠️ This page may combine multiple inventors who share the name “OHSAKI HIROMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
12 patentsUS5393815AFeb 28, 1995
Silazane-based, heat resistant, dielectric coating compositions
SHINETSU CHEMICAL CO23 citations92
US4981666AJan 1, 1991
Method for the preparation of silicon carbide whiskers
SHINETSU CHEMICAL CO33 citations92
US5989305ANov 23, 1999
Feeder of a solid organometallic compound
SHINETSU CHEMICAL CO30 citations89
US4571331AFeb 18, 1986
Ultrafine powder of silicon carbide, a method for the preparation thereof and a sintered body therefrom
SHINETSU CHEMICAL CO38 citations89
US4958040ASep 18, 1990
Process for the preparation of diorganohalogenosilanes
SHINETSU CHEMICAL CO11 citations74
US5951820ASep 14, 1999
Method of purifying an organometallic compound
SHINETSU CHEMICAL CO13 citations73
US5520480AMay 28, 1996
Methods for laying roads
SHINETSU CHEMICAL CO9 citations73
US4762810AAug 9, 1988
Method for the preparation of a sintered body of silicon carbide
SHINETSU CHEMICAL CO16 citations73
US5783717AJul 21, 1998
Method for purifying organometal compound
SHINETSU CHEMICAL CO7 citations72
US5011639AApr 30, 1991
Method for the preparation of a sintered body of silicon carbide
SHINETSU CHEMICAL CO12 citations71
US5354918AOct 11, 1994
Highly pure monoalkylphosphine
SHINETSU CHEMICAL CO10 citations67
US5075474ADec 24, 1991
Method for preparing hexamethyl cyclotrisilazane
SHINETSU CHEMICAL CO5 citations63
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD
4 patentsUS6258972B1Jul 10, 2001
Pattern formation method and surface treating agent
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD18 citations82
US6133465AOct 17, 2000
Pattern formation method and surface treatment agent
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD10 citations74
US6054255AApr 25, 2000
Pattern formation method and surface treating agent
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD9 citations71
US6174650B1Jan 16, 2001
Manufacturing method and apparatus for semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD3 citations62