Inventor

ROUX STEPHEN

US46 patents

⚠️ This page may combine multiple inventors who share the name “ROUX STEPHEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ROUX STEPHEN

ASML HOLDING NV

Wafer handling system for use in lithography patterning

Method and apparatus for isolating light source gas from main chamber gas in a lithography tool

Magnetically levitated and driven reticle-masking blade stage mechanism having six degrees freedom of motion

Method and apparatus for recycling gases used in a lithography tool

Wafer handling method for use in lithography patterning

Method and apparatus for recycling gases used in a lithography tool

System for recycling gases used in a lithography tool

Active faceted mirror system for lithography

Correcting variations in the intensity of light within an illumination field without distorting the telecentricity of the light

Method and apparatus for cooling a reticle during lithographic exposure

Levitated reticle-masking blade stage

Reticle focus measurement method using multiple interferometric beams

Reticle barrier system for extreme ultra-violet lithography

Reticle sub-field thermal control

Lithographic apparatus

Optical element damping systems

Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus

Optical designs of miniaturized overlay measurement system

On chip sensor for wafer overlay measurement

System, method, and apparatus for a magnetically levitated and driven reticle-masking blade stage mechanism

Reticle focus measurement system using multiple interferometric beams

Lithographic apparatus, metrology systems, phased array illumination sources and methods thereof

Reticle gripper barrier system for lithography use

Assembly for use in semiconductor photolithography and method of manufacturing same

Systems and methods for lithographic reticle inspection

Wafer handling method for use in lithography patterning

Method and apparatus for creating a phase step in mirrors used in spatial light modulator arrays

Method for recycling gases used in a lithography tool

Metrology mark structure and method of determining metrology mark structure

Self-referencing integrated alignment sensor

Spectrometric metrology systems based on multimode interference and lithographic apparatus

Apparatuses and methods for changing an intensity distribution of light within an illumination field without distorting the telecentricity of the light

Reticle focus measurement system using multiple interferometric beams

Systems and methods for measuring intensity in a lithographic alignment apparatus

IBM

Method for building interconnect structures by injection molded solder and structures built

Etched glass solder bump transfer for flip chip integrated circuit devices

Method for building interconnect structures by injection molded solder and structures built

Method for building interconnect structures by injection molded solder and structures built

Etched glass solder bump transfer for flip chip integrated circuit devices

ASML NETHERLANDS BV

Mask assembly

Monolithic particle inspection device

Mask assembly

Lithographic apparatus, metrology systems, and methods thereof

SILICON VALLEY GROUP

Removable cover for protecting a reticle, system including and method of using the same

ASML HODING N V

Drive for reticle-masking blade stage

ROUX STEPHEN

Method for controlling the position of a movable object, a control system for controlling a positioning device, and a lithographic apparatus