Inventor
CHIANG CHIA-PING
TW21 patents
⚠️ This page may combine multiple inventors who share the name “CHIANG CHIA-PING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
11 patentsUS10282504B2May 7, 2019
Method for improving circuit layout for manufacturability
TAIWAN SEMICONDUCTOR MFG CO LTD31 citations93
US10324369B2Jun 18, 2019
Methods for generating a mandrel mask
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US9911606B2Mar 6, 2018
Mandrel spacer patterning in multi-pitch integrated circuit manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US12159092B2Dec 3, 2024
Method for coloring circuit layout and system for performing the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11790145B2Oct 17, 2023
Method for coloring circuit layout and system for performing the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11392742B2Jul 19, 2022
Method for coloring circuit layout and system for performing the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11392745B2Jul 19, 2022
Method for improving circuit layout for manufacturability
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US9418191B2Aug 16, 2016
Providing electron beam proximity effect correction by simulating write operations of polygonal shapes
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10853552B2Dec 1, 2020
Method for improving circuit layout for manufacturability
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10796055B2Oct 6, 2020
Method for coloring circuit layout and system for performing the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10509881B2Dec 17, 2019
Method for coloring circuit layout and system for performing the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
TAIWAN SEMICONDUCTOR MFG
7 patentsUS9390217B2Jul 12, 2016
Methodology of optical proximity correction optimization
TAIWAN SEMICONDUCTOR MFG68 citations97
US8381153B2Feb 19, 2013
Dissection splitting with optical proximity correction and mask rule check enforcement
TAIWAN SEMICONDUCTOR MFG21 citations91
US9176373B2Nov 3, 2015
System and method for decomposition of a single photoresist mask pattern into 3 photoresist mask patterns
TAIWAN SEMICONDUCTOR MFG11 citations84
US9165095B2Oct 20, 2015
Target point generation for optical proximity correction
TAIWAN SEMICONDUCTOR MFG4 citations72
US9390223B2Jul 12, 2016
Method of determining whether a layout is colorable
TAIWAN SEMICONDUCTOR MFG2 citations63
US9189588B2Nov 17, 2015
Polygon-based optical proximity correction
TAIWAN SEMICONDUCTOR MFG3 citations62
US8959460B1Feb 17, 2015
Layout decomposition method
TAIWAN SEMICONDUCTOR MFG0 citations39