Inventor
CHIH MING-HUI
TW31 patents
⚠️ This page may combine multiple inventors who share the name “CHIH MING-HUI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
16 patentsUS9679100B2Jun 13, 2017
Environmental-surrounding-aware OPC
TAIWAN SEMICONDUCTOR MFG CO LTD20 citations92
US10324369B2Jun 18, 2019
Methods for generating a mandrel mask
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US9911606B2Mar 6, 2018
Mandrel spacer patterning in multi-pitch integrated circuit manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11048161B2Jun 29, 2021
Optical proximity correction methodology using pattern classification for target placement
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US9411924B2Aug 9, 2016
Methodology for pattern density optimization
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US8972909B1Mar 3, 2015
OPC method with higher degree of freedom
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations70
US12159092B2Dec 3, 2024
Method for coloring circuit layout and system for performing the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11790145B2Oct 17, 2023
Method for coloring circuit layout and system for performing the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11392742B2Jul 19, 2022
Method for coloring circuit layout and system for performing the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10049178B2Aug 14, 2018
Methodology for pattern density optimization
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US9026955B1May 5, 2015
Methodology for pattern correction
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations62
US10036948B2Jul 31, 2018
Environmental-surrounding-aware OPC
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10860774B2Dec 8, 2020
Methodology for pattern density optimization
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10796055B2Oct 6, 2020
Method for coloring circuit layout and system for performing the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10527928B2Jan 7, 2020
Optical proximity correction methodology using pattern classification for target placement
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10509881B2Dec 17, 2019
Method for coloring circuit layout and system for performing the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
TAIWAN SEMICONDUCTOR MFG
9 patentsUS9390217B2Jul 12, 2016
Methodology of optical proximity correction optimization
TAIWAN SEMICONDUCTOR MFG68 citations97
US8943445B2Jan 27, 2015
Method of merging color sets of layout
TAIWAN SEMICONDUCTOR MFG29 citations94
US8381153B2Feb 19, 2013
Dissection splitting with optical proximity correction and mask rule check enforcement
TAIWAN SEMICONDUCTOR MFG21 citations91
US9176373B2Nov 3, 2015
System and method for decomposition of a single photoresist mask pattern into 3 photoresist mask patterns
TAIWAN SEMICONDUCTOR MFG11 citations84
US9165095B2Oct 20, 2015
Target point generation for optical proximity correction
TAIWAN SEMICONDUCTOR MFG4 citations72
US9390223B2Jul 12, 2016
Method of determining whether a layout is colorable
TAIWAN SEMICONDUCTOR MFG2 citations63
US9189588B2Nov 17, 2015
Polygon-based optical proximity correction
TAIWAN SEMICONDUCTOR MFG3 citations62
US9003336B2Apr 7, 2015
Mask assignment optimization
TAIWAN SEMICONDUCTOR MFG0 citations52
US8959460B1Feb 17, 2015
Layout decomposition method
TAIWAN SEMICONDUCTOR MFG0 citations39