Inventor

KAO KUEI-YU

TW49 patents

Patents

49 patents

US11942363B2Mar 26, 2024

Methods of manufacturing transistor gate structures by local thinning of dummy gate stacks using an etch barrier

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73

US12557369B2Feb 17, 2026

Gate profile control through sidewall protection during etching

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

US12300742B2May 13, 2025

Fin field-effect transistor device and method of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

US12243748B2Mar 4, 2025

FinFET device having a gate with a tapering bottom portion and a gate fill material with a widening bottom portion

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

US11482421B2Oct 25, 2022

Method of forming a semiconductor device by a replacement gate process

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations63

US11302581B2Apr 12, 2022

Gate profile control through sidewall protection during etching

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

US11133307B2Sep 28, 2021

FinFETs with locally thinned gate structures and having different distances therebetween

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

US11127741B2Sep 21, 2021

Methods of manufacturing transistor gate structures by local thinning of dummy gate stacks using an etch barrier

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

US12484276B2Nov 25, 2025

Replacement structures

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62

US12463047B2Nov 4, 2025

Methods for forming stacked layers and devices formed thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62

US12426311B1Sep 23, 2025

Gate structures and spacers in semiconductor devices and methods of manufacturing thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62

US12402353B2Aug 26, 2025

Method of manufacturing a semiconductor device and a semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62

US12294023B2May 6, 2025

Method of manufacturing a semiconductor device having corner spacers adjacent a fin sidewall

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62

US12266715B2Apr 1, 2025

Semiconductor devices and methods of manufacturing thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62

US12198984B2Jan 14, 2025

Semiconductor device including gate spacer with tilted portion and method of manufacturing thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62

US12199151B2Jan 14, 2025

Process window control for gate formation in semiconductor devices

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62

US12087638B2Sep 10, 2024

Multi-channel devices and methods of manufacture

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62

US11923440B2Mar 5, 2024

Semiconductor devices and methods of manufacturing thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62

US11769821B2Sep 26, 2023

Semiconductor device having a corner spacer

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62

US11715779B2Aug 1, 2023

Multi-channel devices and methods of manufacture

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62

US11532723B2Dec 20, 2022

Fin-end gate structures and method forming same

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62

US11522073B2Dec 6, 2022

Semiconductor devices and methods of manufacturing thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62

US11476347B2Oct 18, 2022

Processes for removing spikes from gates

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62

US11289585B2Mar 29, 2022

Semiconductor devices and methods of formation

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62

US11264283B2Mar 1, 2022

Multi-channel devices and methods of manufacture

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62

US12364003B2Jul 15, 2025

Semiconductor devices and methods of manufacturing thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61

US12230545B2Feb 18, 2025

Semiconductor devices including dummy gate dielectric layer and methods of manufacturing thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61

US11855093B2Dec 26, 2023

Semiconductor devices and methods of manufacturing thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61

US11842929B2Dec 12, 2023

Semiconductor devices and methods of manufacturing thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61

US11205647B2Dec 21, 2021

Semiconductor device and method of manufacture

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61

US12166096B2Dec 10, 2024

Semiconductor device structure with uneven gate profile

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60

US12034056B2Jul 9, 2024

Semiconductor devices including gate structures with gate spacers

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60

US11652003B2May 16, 2023

Gate formation process

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60

US11631745B2Apr 18, 2023

Semiconductor device structure with uneven gate profile

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60

US11264282B2Mar 1, 2022

Gate formation process

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60

US12261213B2Mar 25, 2025

Fin-end gate structures and method forming same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52

US12402402B2Aug 26, 2025

Transistor gate profile optimization

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50

US12362285B2Jul 15, 2025

Alignment structure for semiconductor device and method of forming same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50

US12288812B2Apr 29, 2025

Semiconductor devices and methods of fabrication thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50

US11557590B2Jan 17, 2023

Transistor gate profile optimization

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50

US11393769B2Jul 19, 2022

Alignment structure for semiconductor device and method of forming same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50

KAO KUEI-YU

Patents

Methods for forming stacked layers and devices formed thereof

Semiconductor devices and methods of manufacturing thereof

Process window control for gate formation in semiconductor devices

Fin field-effect transistor device and method of forming the same

Methods for forming stacked layers and devices formed thereof

Fin field-effect transistor device and method of forming the same

Controlling profiles of replacement gates

Controlling profiles of replacement gates

Methods of manufacturing transistor gate structures by local thinning of dummy gate stacks using an etch barrier

Gate profile control through sidewall protection during etching

Fin field-effect transistor device and method of forming the same

FinFET device having a gate with a tapering bottom portion and a gate fill material with a widening bottom portion

Method of forming a semiconductor device by a replacement gate process

Gate profile control through sidewall protection during etching

FinFETs with locally thinned gate structures and having different distances therebetween

Methods of manufacturing transistor gate structures by local thinning of dummy gate stacks using an etch barrier

Replacement structures

Methods for forming stacked layers and devices formed thereof

Gate structures and spacers in semiconductor devices and methods of manufacturing thereof

Method of manufacturing a semiconductor device and a semiconductor device

Method of manufacturing a semiconductor device having corner spacers adjacent a fin sidewall

Semiconductor devices and methods of manufacturing thereof

Semiconductor device including gate spacer with tilted portion and method of manufacturing thereof

Process window control for gate formation in semiconductor devices

Multi-channel devices and methods of manufacture

Semiconductor devices and methods of manufacturing thereof

Semiconductor device having a corner spacer

Multi-channel devices and methods of manufacture

Fin-end gate structures and method forming same

Semiconductor devices and methods of manufacturing thereof

Processes for removing spikes from gates

Semiconductor devices and methods of formation

Multi-channel devices and methods of manufacture

Semiconductor devices and methods of manufacturing thereof

Semiconductor devices including dummy gate dielectric layer and methods of manufacturing thereof

Semiconductor devices and methods of manufacturing thereof

Semiconductor devices and methods of manufacturing thereof

Semiconductor device and method of manufacture

Semiconductor device structure with uneven gate profile

Semiconductor devices including gate structures with gate spacers

Gate formation process

Semiconductor device structure with uneven gate profile

Gate formation process

Fin-end gate structures and method forming same

Transistor gate profile optimization

Alignment structure for semiconductor device and method of forming same

Semiconductor devices and methods of fabrication thereof

Transistor gate profile optimization

Alignment structure for semiconductor device and method of forming same