Inventor

WON TAE KYUNG

US50 patents

⚠️ This page may combine multiple inventors who share the name “WON TAE KYUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WON TAE KYUNG

APPLIED MATERIALS INC

Water-barrier performance of an encapsulating film

Method to improve transmittance of an encapsulating film

Controlling the properties and uniformity of a silicon nitride film by controlling the film forming precursors

Plasma uniformity control by gas diffuser hole design

Method of controlling film uniformity and composition of a PECVD-deposited A-SiNx : H gate dielectric film deposited over a large substrate surface

Repeatability of CVD film deposition during sequential processing of substrates in a deposition chamber

Method of improving the uniformity of PECVD-deposited thin films

Water-barrier performance of an encapsulating film

Method to improve water-barrier performance by changing film surface morphology

Film stress control for plasma enhanced chemical vapor deposition

Application of carbon doped silicon oxide film to flat panel industry

Plasma uniformity control by gas diffuser hole design

Process for controlling thin film uniformity and products produced thereby

Film stress control for plasma enhanced chemical vapor deposition

Film stress control for plasma enhanced chemical vapor deposition

Thin-film encapsulation

CVD thin film stress control method for display application

SiON gradient concept

Oxygen vacancy of IGZO passivation by fluorine treatment

Indium gallium zinc oxide layers for thin film transistors

Plasma treatment on metal-oxide TFT

Multi-antenna unit for large area inductively coupled plasma processing apparatus

Methods of tuning to improve plasma stability

Thin-film encapsulation

Silicon layer on a laser transparent conductive oxide layer suitable for use in solar cell applications

Microcrystalline silicon thin film transistor

Methods for forming an amorphous silicon film in display devices

Substrate support for chucking of mask for deposition processes

Interface engineering for high capacitance capacitor for liquid crystal display

Selective in-situ cleaning of high-k films from processing chamber using reactive gas precursor

Plasma treatment on metal-oxide TFT

Thin film transistor fabrication utlizing an interface layer on a metal electrode layer

Multilayer passivation or etch stop TFT

Plasma treatment on metal-oxide TFT

Multilayer passivation or etch stop TFT

Pin hole evaluation method of dielectric films for metal oxide semiconductor TFT

Method of reducing an electrostatic charge on a substrate during a PECVD process

Fuel cell conditioning layer

Low temperature multilayer dielectric film for passivation and capacitor

Remote plasma source cleaning nozzle for cleaning a gas distribution plate

CHOI SOO YOUNG

Plasma uniformity control by gas diffuser hole design

Plasma uniformity control by gas diffuser hole design

Apparatus for depositing a uniform silicon film and methods for manufacturing the same

WON TAE KYUNG

SiOx process chemistry development using microwave plasma CVD

Thin film deposition using microwave plasma

Microcrystalline silicon thin film transistor

YANG YA-TANG

Plasma enhanced chemical vapor deposition technology for large-size processing

Low temperature thin film transistor process, device property, and device stability improvement

APPLIED KOMATSU TECHNOLOGY INC

Film deposition using a finger type shadow frame

SHENG SHURAN

Multi-junction solar cells and methods and apparatuses for forming the same