Inventor
HIROSE NAOKI
JP39 patents
⚠️ This page may combine multiple inventors who share the name “HIROSE NAOKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SEMICONDUCTOR ENERGY LAB
31 patentsUS5427824AJun 27, 1995
CVD apparatus
SEMICONDUCTOR ENERGY LAB352 citations99
US5183511AFeb 2, 1993
Photo CVD apparatus with a glow discharge system
SEMICONDUCTOR ENERGY LAB532 citations99
US4950624AAug 21, 1990
Method of depositing films using photo-CVD with chamber plasma cleaning
SEMICONDUCTOR ENERGY LAB356 citations97
US5039548AAug 13, 1991
Plasma chemical vapor reaction method employing cyclotron resonance
SEMICONDUCTOR ENERGY LAB77 citations96
US4926791AMay 22, 1990
Microwave plasma apparatus employing helmholtz coils and ioffe bars
SEMICONDUCTOR ENERGY LAB67 citations96
US6191492B1Feb 20, 2001
Electronic device including a densified region
SEMICONDUCTOR ENERGY LAB52 citations95
US5147822ASep 15, 1992
Plasma processing method for improving a package of a semiconductor device
SEMICONDUCTOR ENERGY LAB57 citations95
US6423383B1Jul 23, 2002
Plasma processing apparatus and method
SEMICONDUCTOR ENERGY LAB14 citations92
US6217661B1Apr 17, 2001
Plasma processing apparatus and method
SEMICONDUCTOR ENERGY LAB16 citations92
US6013338AJan 11, 2000
CVD apparatus
SEMICONDUCTOR ENERGY LAB18 citations92
US5855970AJan 5, 1999
Method of forming a film on a substrate
SEMICONDUCTOR ENERGY LAB21 citations92
US5629245AMay 13, 1997
Method for forming a multi-layer planarization structure
SEMICONDUCTOR ENERGY LAB19 citations92
US5203959AApr 20, 1993
Microwave plasma etching and deposition method employing first and second magnetic fields
SEMICONDUCTOR ENERGY LAB50 citations92
US5079031AJan 7, 1992
Apparatus and method for forming thin films
SEMICONDUCTOR ENERGY LAB29 citations92
US5013688AMay 7, 1991
Method of manufacturing a semiconductor using plasma processing
SEMICONDUCTOR ENERGY LAB23 citations92
US4973883ANov 27, 1990
Plasma processing apparatus with a lisitano coil
SEMICONDUCTOR ENERGY LAB38 citations89
US6756670B1Jun 29, 2004
Electronic device and its manufacturing method
SEMICONDUCTOR ENERGY LAB15 citations83
US5302226AApr 12, 1994
Apparatus for microwave processing in a magnetic field
SEMICONDUCTOR ENERGY LAB17 citations82
US5041201AAug 20, 1991
Plasma processing method and apparatus
SEMICONDUCTOR ENERGY LAB21 citations82
US6520189B1Feb 18, 2003
CVD apparatus
SEMICONDUCTOR ENERGY LAB8 citations74
US5858259AJan 12, 1999
Plasma processing apparatus and method
SEMICONDUCTOR ENERGY LAB7 citations74
US5685913ANov 11, 1997
Plasma processing apparatus and method
SEMICONDUCTOR ENERGY LAB4 citations74
US5225367AJul 6, 1993
Method for manufacturing an electronic device
SEMICONDUCTOR ENERGY LAB7 citations74
US5196366AMar 23, 1993
Method of manufacturing electric devices
SEMICONDUCTOR ENERGY LAB12 citations74
US4887548ADec 19, 1989
Thin film manufacturing system
SEMICONDUCTOR ENERGY LAB12 citations74
US4949004AAug 14, 1990
Gas discharge lamp having temperature controlled, liquid reservoir for liquified portion of gas
SEMICONDUCTOR ENERGY LAB10 citations73
US5192995AMar 9, 1993
Electric device utilizing antioxidation film between base pad for semiconductor chip and organic encapsulating material
SEMICONDUCTOR ENERGY LAB9 citations72
US6838126B2Jan 4, 2005
Method for forming I-carbon film
SEMICONDUCTOR ENERGY LAB2 citations63
US6677001B1Jan 13, 2004
Microwave enhanced CVD method and apparatus
SEMICONDUCTOR ENERGY LAB5 citations63
US4768464ASep 6, 1988
Chemical vapor reaction apparatus
SEMICONDUCTOR ENERGY LAB4 citations63
US4803095AFeb 7, 1989
Chemical vapor reaction process by virtue of uniform irradiation
SEMICONDUCTOR ENERGY LAB0 citations52