Inventor
OKUNISHI NAOHIKO
JP26 patents
⚠️ This page may combine multiple inventors who share the name “OKUNISHI NAOHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
21 patentsUS11699576B2Jul 11, 2023
Filter device and plasma processing apparatus
TOKYO ELECTRON LTD2 citations72
US10332728B2Jun 25, 2019
Plasma processing apparatus
TOKYO ELECTRON LTD3 citations72
US9530619B2Dec 27, 2016
Plasma processing apparatus and filter unit
TOKYO ELECTRON LTD6 citations72
US11145490B2Oct 12, 2021
Plasma processing method
TOKYO ELECTRON LTD2 citations71
US10665416B2May 26, 2020
Substrate processing apparatus
TOKYO ELECTRON LTD4 citations71
US11908664B2Feb 20, 2024
Plasma processing apparatus
TOKYO ELECTRON LTD0 citations62
US11694881B2Jul 4, 2023
Stage and plasma processing apparatus
TOKYO ELECTRON LTD1 citations62
US11501958B2Nov 15, 2022
Plasma processing apparatus
TOKYO ELECTRON LTD0 citations62
US10886109B2Jan 5, 2021
Stage and plasma processing apparatus
TOKYO ELECTRON LTD1 citations62
US12334309B2Jun 17, 2025
Filter device and plasma processing apparatus
TOKYO ELECTRON LTD0 citations61
US11495443B2Nov 8, 2022
Filter device and plasma processing apparatus
TOKYO ELECTRON LTD1 citations61
US10897808B2Jan 19, 2021
Filter device and plasma processing apparatus
TOKYO ELECTRON LTD0 citations61
US11456160B2Sep 27, 2022
Plasma processing apparatus
TOKYO ELECTRON LTD1 citations57
US9754766B2Sep 5, 2017
Plasma processing apparatus
TOKYO ELECTRON LTD1 citations51
US10546723B2Jan 28, 2020
Plasma processing method
TOKYO ELECTRON LTD0 citations50
US10096454B2Oct 9, 2018
Plasma processing apparatus
TOKYO ELECTRON LTD1 citations50
US10074519B2Sep 11, 2018
Plasma processing apparatus and filter unit
TOKYO ELECTRON LTD1 citations50
US10651813B2May 12, 2020
Method for designing filter
TOKYO ELECTRON LTD0 citations48
US11037762B2Jun 15, 2021
Plasma processing apparatus
TOKYO ELECTRON LTD0 citations41
US9646867B2May 9, 2017
Plasma processing apparatus, power supply unit and mounting table system
TOKYO ELECTRON LTD0 citations39
US10763087B2Sep 1, 2020
Plasma processing apparatus
TOKYO ELECTRON LTD0 citations36
SAMSUNG ELECTRONICS CO LTD
3 patentsUS12210045B2Jan 28, 2025
Impedance measurement jig and method of controlling a substrate-processing apparatus using the jig
SAMSUNG ELECTRONICS CO LTD0 citations60
US11538660B2Dec 27, 2022
Plasma processing apparatus and method of fabricating semiconductor device using same
SAMSUNG ELECTRONICS CO LTD0 citations46
US12222362B2Feb 11, 2025
Method of measuring parameters of plasma, apparatus for measuring parameters of plasma, plasma processing system, and method of processing wafer
SAMSUNG ELECTRONICS CO LTD0 citations45