Inventor
UI AKIO
JP22 patents
⚠️ This page may combine multiple inventors who share the name “UI AKIO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
11 patentsUS5403630AApr 4, 1995
Vapor-phase growth method for forming S2 O2 films
TOSHIBA KK458 citations98
US6164295ADec 26, 2000
CVD apparatus with high throughput and cleaning method therefor
TOSHIBA KK79 citations96
US10388544B2Aug 20, 2019
Substrate processing apparatus and substrate processing method
TOSHIBA KK45 citations93
US5976992ANov 2, 1999
Method of supplying excited oxygen
TOSHIBA KK40 citations92
US5205870AApr 27, 1993
Vapor deposition apparatus
TOSHIBA KK15 citations73
US9934944B2Apr 3, 2018
Plasma induced flow electrode structure, plasma induced flow generation device, and method of manufacturing plasma induced flow electrode structure
TOSHIBA KK5 citations72
US7851367B2Dec 14, 2010
Method for plasma processing a substrate
TOSHIBA KK4 citations62
US7247888B2Jul 24, 2007
Film forming ring and method of manufacturing semiconductor device
TOSHIBA KK5 citations60
US10518270B2Dec 31, 2019
Dust collector and air conditioner
TOSHIBA KK0 citations52
US11497110B2Nov 8, 2022
Dielectric barrier discharge electrode and dielectric barrier discharge device
TOSHIBA KK0 citations51
US9468698B2Oct 18, 2016
Gas processing apparatus
TOSHIBA KK1 citations51
UI AKIO
4 patentsUS8821684B2Sep 2, 2014
Substrate plasma processing apparatus and plasma processing method
UI AKIO52 citations92
US8821744B2Sep 2, 2014
Substrate processing method and substrate processing apparatus
UI AKIO4 citations72
US9583360B2Feb 28, 2017
Substrate processing apparatus and substrate processing method
UI AKIO1 citations51
US8252193B2Aug 28, 2012
Plasma processing apparatus of substrate and plasma processing method thereof
UI AKIO1 citations51
TOSHIBA MEMORY CORP
4 patentsUS10332906B2Jun 25, 2019
Dry etching method and method for manufacturing semiconductor device
TOSHIBA MEMORY CORP6 citations71
US10381198B2Aug 13, 2019
Plasma processing apparatus and plasma processing method
TOSHIBA MEMORY CORP1 citations62
US9799482B2Oct 24, 2017
Device manufacturing apparatus and manufacturing method of magnetic device using structure to pass ion beam
TOSHIBA MEMORY CORP1 citations52
US10672615B2Jun 2, 2020
Plasma processing apparatus and plasma processing method
TOSHIBA MEMORY CORP0 citations41