Inventor
UCHIDA HIROTO
JP26 patents
⚠️ This page may combine multiple inventors who share the name “UCHIDA HIROTO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MITSUBISHI MATERIALS CORP
8 patentsUS5696384ADec 9, 1997
Composition for formation of electrode pattern
MITSUBISHI MATERIALS CORP46 citations92
US5605723AFeb 25, 1997
Method for forming a pattern of non-volatile ferroelectric thin film memory
MITSUBISHI MATERIALS CORP20 citations92
US5767302AJun 16, 1998
High-purity TI complexes, methods for producing the same and BST film-forming liquid compositions
MITSUBISHI MATERIALS CORP24 citations91
US6280518B1Aug 28, 2001
Organic titanium compound suitable for MOCVD
MITSUBISHI MATERIALS CORP9 citations71
US6521770B2Feb 18, 2003
Organozirconium compound, organic solution comprising same, and zirconium-containing thin film therefrom
MITSUBISHI MATERIALS CORP4 citations60
US6355097B2Mar 12, 2002
Organic titanium compound suitable for MOCVD
MITSUBISHI MATERIALS CORP3 citations60
US5786025AJul 28, 1998
Ba and/or Sr titanate films by organic chemical vapor deposition
MITSUBISHI MATERIALS CORP5 citations57
US5134029AJul 28, 1992
Substrate used for fabrication of thick film circuit
MITSUBISHI MATERIALS CORP2 citations57
SYMETRIX CORP
6 patentsUS6051858AApr 18, 2000
Ferroelectric/high dielectric constant integrated circuit and method of fabricating same
SYMETRIX CORP125 citations98
US6022669AFeb 8, 2000
Method of fabricating an integrated circuit using self-patterned thin films
SYMETRIX CORP25 citations92
US5942376AAug 24, 1999
Shelf-stable liquid metal arylketone alcoholate solutions and use thereof in photoinitiated patterning of thin films
SYMETRIX CORP34 citations92
US5849465ADec 15, 1998
Photosensitive titanium carboxydiketonate and titanium carboxyketoester precursor solutions and method of patterning integrated circuits using the same
SYMETRIX CORP22 citations92
US5792592AAug 11, 1998
Photosensitive liquid precursor solutions and use thereof in making thin films
SYMETRIX CORP19 citations84
US5788757AAug 4, 1998
Composition and process using ester solvents for fabricating metal oxide films and electronic devices including the same
SYMETRIX CORP6 citations73